Growing community of inventors

Oak Ridge, TN, United States of America

John Whealton

Average Co-Inventor Count = 4.62

ph-index = 3

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 49

John WhealtonMichael Leon Simpson (2 patents)John WhealtonClarence E Thomas (2 patents)John WhealtonDouglas H Lowndes (2 patents)John WhealtonJohn B Wilgen (2 patents)John WhealtonMichael J Paulus (2 patents)John WhealtonEdgar Voelkl (2 patents)John WhealtonLarry R Baylor (2 patents)John WhealtonJohn C Whitson (2 patents)John WhealtonGregory Richard Hanson (1 patent)John WhealtonTimothy S Bigelow (1 patent)John WhealtonChin-Chi Tsai (1 patent)John WhealtonRonald Lee Graves (1 patent)John WhealtonJohn M Storey (1 patent)John WhealtonRichard J Raridon (1 patent)John WhealtonJeffrey S Armfield (1 patent)John WhealtonJohn Whealton (4 patents)Michael Leon SimpsonMichael Leon Simpson (35 patents)Clarence E ThomasClarence E Thomas (22 patents)Douglas H LowndesDouglas H Lowndes (21 patents)John B WilgenJohn B Wilgen (18 patents)Michael J PaulusMichael J Paulus (14 patents)Edgar VoelklEdgar Voelkl (8 patents)Larry R BaylorLarry R Baylor (5 patents)John C WhitsonJohn C Whitson (2 patents)Gregory Richard HansonGregory Richard Hanson (18 patents)Timothy S BigelowTimothy S Bigelow (10 patents)Chin-Chi TsaiChin-Chi Tsai (4 patents)Ronald Lee GravesRonald Lee Graves (4 patents)John M StoreyJohn M Storey (3 patents)Richard J RaridonRichard J Raridon (2 patents)Jeffrey S ArmfieldJeffrey S Armfield (2 patents)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Ut-battelle, Inc. (3 from 1,620 patents)

2. The United States of America As Represented by the Department of Energy (1 from 902 patents)


4 patents:

1. 6917043 - Individually addressable cathodes with integrated focusing stack or detectors

2. 6568362 - Rotating arc spark plug

3. 6498349 - Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy

4. 6422002 - Method for generating a highly reactive plasma for exhaust gas aftertreatment and enhanced catalyst reactivity

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1/1/2026
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