Dow Global Technolgoies LLC

Rohm & Haas Electronic Materials LLC

Rohm and Haas Company

University of California

Cornell Research Foundation Inc.

Cornell University

Medtronic, Inc.

Rohm and Haas Electronic Materials Korea Ltd.

John W Kramer

Peter Trefonas, Iii

Sukrit Mukhopadhyay

Geoffrey William Coates

Anatoliy N Sokolov

David D Devore

Liam P Spencer

Phillip Dene Hustad

Craig Jon Hawker

Jong Keun Park

Daniel J Arriola

Thomas P Clark

Curtis Alan Schwartz

David Laitar

Erin B Vogel

Shih-Wei Chang

Thomas Peterson

Ying O'Connor

Qichun Wan

Brian W Goodfellow

Robert David Grigg

Benjaporn Narupai

Zachariah Allen Page

Christian Wilhelm Pester

Christopher M Hobot

Aleksander Jozef Pyzik

Shaoguang Feng

Michael Eric Benz

Nahrain E Kamber

Phillip Edward McDonald

Zhengming Tang

Paul G Clark

Vivek Kalihari

Kinjalbahen Joshi

Hong-Yeop Na

Xiaodong Lu

Timothy De Vries

Jose Antonio Trejo-O'Reilly

William H H Woodward

Minrong Zhu

Jichang Feng

Chun Liu

Yoo-Jin Doh

Kenneth L Kearns, Jr

Lian Leon Luo

Joseph A R Schmidt

Nicolas J Treat

Thomas H Peterson

Iii Peter Trefonas

Kathleen Keller

Brett P Fors

Jose Antonio Trejo-O' Reilly

Lian L Luo

The present invention provides a quantum dot light emitting diode comprising i) an emitting layer of at least one semiconductor nanoparticle made from semiconductor materials selected from the group consisting of Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof; and ii) a polymer for hole injection or hole transport layer, comprising one or more triaryl aminium radical cations having the structure (S1).

Quantum dot light emitting devices

The present invention provides a quantum dot light emitting diode comprising i) an emitting layer of at least one semiconductor nanoparticle made from semiconductor materials selected from the group consisting of Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof; and ii) a polymer for hole injection or hole transport layer; and the polymer comprises, as polymerized units, at least one or more monomers having a first monomer structure comprising a) a polymerizable group, b) an electroactive group with formula NArArArwherein Ar, Arand Arindependently are C-Caromatic substituents, and (c) a linker group connecting the polymerizable group and the electroactive group.

A method of fabricating a three-dimensional object, the method comprising: combining at least one of a meth(acrylate), a (meth)acrylamide, a (meth)acrylonitrile, a styrene, an acrylonitrile, a vinyl acetate, a vinylcarbazole, a vinylpyridine, a vinyl ether, a vinyl chloride monomers, a polyfunctional monomer, and a polyfunctional prepolymer with an organic photoredox catalyst to provide a reaction mixture; depositing the reaction mixture; polymerizing the monomers by irradiating the reaction mixture with a light source; and repeating the depositing step until the three-dimensional object is formed.

Method of additive manufacturing using photoregulated radical polymerization

The present invention relates to a polymeric charge transfer layer comprising a polymer and a p-dopant. The polymer comprises as polymerized units, Monomer A, Monomer B, and Monomer C crosslinking agent. The present invention further relates to an organic electronic device, especially an organic light emitting device containing the polymeric charge transfer layer.

Polymeric charge transfer layer and organic electronic device containing the same

Disclosed herein is an article comprising a substrate; a first region having a first brush polymer chemically bonded to the substrate; where the first brush polymer comprises repeat units of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer; where the first ethylenically unsaturated monomer comprises a first electroactive moiety and where the second ethylenically unsaturated monomer comprises a second electroactive moiety that is different from the first electroactive moiety; where at least one of the first electroactive moiety or the second electroactive moiety is an emitter moiety and where the repeat units of the first ethylenically unsaturated monomer are covalently bonded to repeat units of the second ethylenically unsaturated monomer.

Photopatterned growth of electronically active brush polymers for light emitting diode displays

Disclosed herein is a device comprising a substrate; where the substrate comprises a plurality of brush polymers that are covalently or ionically bonded to the substrate; where at least a portion of the brush polymers comprise a covalently bonded emitter moiety.

A polymer comprises the polymerized product of monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, and a photoacid-generating monomer; a chain transfer agent of the formula; wherein Z is a y valent Corganic group, x is 0 or 1, Ris a substituted or unsubstituted Calkyl, Ccycloalkyl, Caryl, or Caralkyl; and optionally, an initiator.

Polymer composition and photoresist comprising same

The present invention provides personal care formulations containing silicone modified polyolefins and having improved sensory feel, as well as being non-tacky and easily spreadable. The present invention also provides a method for treating body surfaces such as skin, hair, nails, etc., by applying the aforesaid personal care formulations externally to such a surface. The present invention also provides a method for improving the sensory feel of personal care formulations by including one or more silicone modified polyolefins in the formulations.

Silicone modified polyolefins in personal care applications

Described are personal care, preferably skin care compositions, comprising polyolefin blends comprising at least one metallocene catalyzed polyolefin with a density above 0.90 g/cm, at least one metallocene catalyzed polyolefin with a density equal to or below 0.90 g/cm, provided that the average melt index for the polyolefin blend is greater than 7; and a cosmetically acceptable hydrocarbon oil, provided that the composition does not contain ethylene acrylic copolymer.

Personal care sensory agents

An acid-labile hyperbranched copolymer is formed by copolymerizing monomers that include a difunctional monomer and a mono(meth)acrylate ester. The difunctional monomer includes at least one formal group, acetal group, or ketal group that makes the copolymer acid-labile. The copolymer is useful as a component of a photoresist composition that provides low line width roughness, among other desirable photolithographic properties.

Acid-labile hyperbranched copolymer and associated photoresist composition and method of forming an electronic device

Disclosed herein is a composition comprising a brush polymer; where the brush polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and a block copolymer; where the block copolymer comprises a first block and a second block that are covalently bonded to each other; where the first block comprises a first polymer and a second block comprises a second polymer; where the first polymer comprises less than or equal to 10 atomic percent polysiloxane; where the second polymer comprises at least 15 atomic percent polysiloxane; where the brush polymer is chemically different from the first polymer and the second polymer; and where the first polymer is chemically different from the second polymer; and wherein the block copolymer is disposed upon the brush polymer.

Method of controlling block copolymer characteristics and articles manufactured therefrom

Catalysts and methods for the carbonylation of epoxides to substituted 3-hydroxy-&#x3b4;-lactones and &#x3b2;-lactones are disclosed.

Substituted 3-hydroxy-&#x3b4;-lactones from epoxides

Disclosed herein is a block copolymer comprising a first block derived from a vinyl aromatic monomer; where the vinyl aromatic monomer has at least one alkyl substitution on an aromatic ring; a second block derived from a siloxane monomer; where a chi parameter that measures interactions between the first block and the second block is 0.03 to 0.18 at a temperature of 200&#xb0; C. Disclosed herein is a method comprising polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing a siloxane monomer; and where the block copolymer has a chi parameter of 0.03 to 0.18 at a temperature of 200&#xb0; C.; where the chi parameter is a measure of interactions between the first block and the second block of the copolymer.

Methods for annealing block copolymers and articles manufactured therefrom

A compound has formula (I): wherein in formula (I), Z is a y valent Corganic group, Aand Aare each independently ester containing or non-ester containing and are fluorinated or non-fluorinated, and are independently Calkylene, Ccycloalkylene, Carylene, or Caralkylene, and Acontains a nitrile, ester, or aryl substituent group alpha to the point of attachment with sulfur, L is a heteroatom or a single bond, Xis a single bond, &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;C(&#x2550;O)&#x2014;O&#x2014;, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;O&#x2014;, &#x2014;C(&#x2550;O)&#x2014;NR&#x2014;, &#x2014;NR&#x2014;C(&#x2550;O)&#x2014;, &#x2014;NR&#x2014;C(&#x2550;O)&#x2014;NR&#x2014;, &#x2014;S(&#x2550;O)&#x2014;O&#x2014;, &#x2014;O&#x2014;S(&#x2550;O)&#x2014;O&#x2014;, &#x2014;NR&#x2014;S(&#x2550;O)&#x2014;, or &#x2014;S(&#x2550;O)&#x2014;NR, wherein R is H, Calkyl, Ccycloalkyl or Caryl, Qis an anionic group, Gis a metallic or non-metallic cation, and y is an integer from 1 to 6. A polymer having end groups comprising the reaction product of the compound of formula (I), and a method of making a polymer, are also disclosed.

Photoacid generator compound, polymer comprising end groups containing the photoacid generator compound, and method of making

A polymer comprises the polymerized product of unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of the foregoing monomers, with a chain transfer agent of Formula (I); wherein in Formula (I), Z is a y valent Corganic group, L is a heteroatom or a single bond, Aand Aare each independently ester containing or non-ester containing and are fluorinated or non-fluorinated, and are independently Calkylene, Ccycloalkylene, Carylene, or Caralkylene, and Acontains a nitrile, ester, or aryl substituent group alpha to the point of attachment with sulfur, Xis a single bond, &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;C(&#x2550;O)&#x2014;O&#x2014;, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;O&#x2014;, &#x2014;C(&#x2550;O)&#x2014;NR&#x2014;, &#x2014;NR&#x2014;C(&#x2550;O)&#x2014;, &#x2014;NR&#x2014;C(&#x2550;O)&#x2014;NR&#x2014;, &#x2014;S(&#x2550;O)&#x2014;O&#x2014;, &#x2014;O&#x2014;S(&#x2550;O)&#x2014;O&#x2014;, &#x2014;NR&#x2014;S(&#x2550;O)&#x2014;, or &#x2014;S(&#x2550;O)&#x2014;NR, wherein R is H, Calkyl, Ccycloalkyl or Caryl, Yis an anionic group, Gis a metallic or non-metallic cation, and y is an integer of 1 to 6. A photoresist composition comprising the polymer, a coated substrate, comprising a layer of the photoresist composition, and a method of forming an electronic device from the photoresist, are also disclosed.

Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device

Growing community of inventors

Midland, MI, United States of America

John W Kramer