Fairchild Semiconductor Corporation

Other

John Tracey Andrews

Hamza Yilmaz

Bruce Douglas Marchant

Ihsiu Ho

Daren W Keller

Kenneth R Whittinghill

In one general aspect, an apparatus can include an energy storage device configured to store energy during an unclamped inductive switching test of a target device, and a switch device configured to shunt at least a portion of energy away from the target device in response to the target device changing from a breakdown state to a failure state.

Apparatus related to an inductive switching test

A process for forming a vertically conducting semiconductor device includes providing a semiconductor substrate having a topside surface and a backside surface. The semiconductor substrate serves as a terminal of the vertically conducting device for biasing the vertically conducting device during operation. The process also includes forming an epitaxial layer extending over the topside surface of the semiconductor substrate but terminating prior to reaching an edge of the semiconductor substrate so as to form a recessed region along a periphery of the semiconductor substrate. The method also includes forming an interconnect layer extending into the recessed region but terminating prior to reaching an edge of the semiconductor substrate. The interconnect layer electrically contacts the topside surface of the semiconductor substrate in the recessed region to thereby provide a topside contact to the semiconductor substrate.

Method of forming a topside contact to a backside terminal of a semiconductor device

A FET is formed as follows. A trench is formed in a silicon region. A shield electrode is formed in a bottom portion of the trench. The shield electrode is insulated from adjacent silicon region by a shield dielectric. A silicon nitride layer is formed over a surface of the silicon region adjacent the trench, along the trench sidewalls, and over the shield electrode and shield dielectric. A layer of LTO is formed over the silicon nitride layer such that those portions of the LTO layer extending over the surface of the silicon region adjacent the trench are thicker than the portion of the LTO layer extending over the shield electrode. The LTO layer is uniformly etched back such that a portion of the silicon nitride layer becomes exposed while portions of the silicon nitride layer remain covered.

Structure and method for forming laterally extending dielectric layer in a trench-gate FET

A vertically conducting semiconductor device includes a semiconductor substrate having a topside surface and a backside surface. The semiconductor substrate serves as a terminal of the vertically conducting device for biasing the vertically conducting device during operation. An epitaxial layer extends over the topside surface of the semiconductor substrate but terminates prior to reaching an edge of the semiconductor substrate so as to form a recessed region along a periphery of the semiconductor substrate. An interconnect layer extends into the recessed region but terminates prior to reaching an edge of the semiconductor substrate. The interconnect layer electrically contacts the topside surface of the semiconductor substrate in the recessed region to thereby provide a topside contact to the semiconductor substrate.

Structure and method of forming a topside contact to a backside terminal of a semiconductor device

A field effect transistor (FET) is formed as follows. A trench is formed in a silicon region. An oxidation barrier layer is formed over a surface of the silicon region adjacent the trench and along the trench sidewalls and bottom. A protective layer is formed over the oxidation barrier layer inside and outside the trench. The protective layer is partially removed such that a portion of the oxidation barrier layer extending at least along the trench bottom becomes exposed and portions of the oxidation barrier layer extending over the surface of the silicon region adjacent the trench remain covered by remaining portions of the protective layer.

Method for forming laterally extending dielectric layer in a trench-gate FET

A vibrating, body-piercing jewelry item having a vibrating motor unit, a housing for the vibrating motor unit, a post, a keeper, retainer or clamping device for holding the item on a wearer's body, a power source for operating the vibrating motor unit, and an actuator for the vibrating motor unit. The vibrating, body-piercing jewelry may be worn on a part of the body that is either unpierced or pierced.

Growing community of inventors

Eagle Mountain, UT, United States of America

John Tracey Andrews