The State University of New York

E.i. Dupont De Nemours and Company

John T Welch

Kulbinder Kumar Banger

Rolf Claessen

Michael Henry Cynamon

Paul J Toscano

Silvana C Ngo

Andrei Kornilov

Alain E Kaloyeros

Leonid Heifets

Seiichiro Higashiya

Linbin Zhong

The invention provides compounds of the Formula (I), methods of making the compounds, and devices comprising the compounds. 

Aryl tetrafluorosulfanyl compounds

Organosilver complexes with &bgr;-diketonates and neutral coordinating ligands are useful as silver precursors in chemical vapor deposition processes. The &bgr;-diketonates include 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate (hfac), acetylacetonate (acac), 2,2,6,6-tetramethyl-3,5-heptanedionate (tmhd), 1,1,1-trifluoro-2,4-pentanedionate, (tfac), 2,2,7-trimethyl-3,5-octanedionate (tmod), 1,1,1-trifluoro-5,5-dimethyl-2,4-pentanedionate (tfh) 1,1,1,2,2,3,3,7,7,8,8,9,9,9-tetradecafluoro-4,6-nonanedionate (tdf). Neutral coordinating ligands include triphenylphosphine, tributylphosphine, pyridine, tetramethylethanediamine (TMEDA) and tetramethylpropanediamine (TMPDA).

Silver precursors for CVD processes

Aminomethylene amide analogs of pyrazinamide with intracellular antimycobacterial activity against pyrazinamide-resistant mycobacteria combined with a rifamycin

Chemical vapor deposition processes utilize as precursors volatile metal complexes with ligands containing metalloid elements silicon, germanium, tin or lead.

MOCVD precursors based on organometalloid ligands

Volatile metal complexes with &agr;-sila-&bgr;-diketonate ligands containing haloalkyl, and particularly, perfluoroalkyl, substitutents are useful as metal precursors for chemical vapor deposition processes and as nanostructured materials containing fluorous domains.

MOCVD processes using precursors based on organometalloid ligands

A composition relating to metal-triflamide complexes useful as catalysts for the syndiotactic polymerization of styrene is disclosed.

Metal triflimide complexes

Compounds of formula II ##STR1## wherein R.sup.1 is a hydrocarbon, halogenated hydrocarbon, polyether, substituted phenyl, substituted benzyl or alkylamine; and R.sup.2, R.sup.3 and R.sup.4 are hydrogen, lower alkyl, halogen, haloalkyl, alkoxy and similar substituents are disclosed. The compounds are useful in the treatment of M. avium. Methods and compositions utilizing novel as well as known compounds are disclosed.

Pyrazinoic acid esters as anti-mycobacterium avium agents

Pyrazinoic esters have been prepared. Compounds of this group are effective against mycobacteria including Mycobacteria tuberculosis, pyrazinamide-resistant Mycobacteria tuberculosis, Mycobacteria bovis and Mycobacteria kansasii.

Pyrazinoic acid esters as antituberculosis agents

N-[Heterocyclicaminocarbonyl]-1H-indene and tetrahydronaphthalene sulfonamides, such as 2,3-dihydro-N-[(4,6-dimethoxypyrimidin-2-yl)aminocarbonyl]-1H-indene-4-sul fonamide, are useful for the regulation of plant growth and as preemergent and postemergent herbicides.

Growing community of inventors

Albany, NY, United States of America

John T Welch