Nuventix, Inc.

Applied Materials, Inc.

Rainbow Display Serivices

Rainbow Display Devices, Inc.

John Stanley Booth

Raghavendran Mahalingam

Paul E Pergande

Daniel N Grimm

Stephen P Darbin

Lee M Jones

Robert Taylor Reichenbach

Michael Robert Rice

Samuel Neil Heffington

Lloyd M Berken

Richard Giljum

Frederik W Freerks

Lance S Reinke

Markus Schwickert

M Uenia Crithfield

David Schott

Rick Ball

Michael Holtzman

Steve Farrell

William Reams

Daniel W McFatter

A light source () is provided which comprises (a) a housing element (); (b) a heat sink (); (c) a first flow channel element () which, alone or in combination with said housing element, creates (i) a first set of flow paths () for the flow of fluid in a first direction through the light source, and (ii) a second set of flow paths () for the flow of fluid in a second direction through the light source; (d) a set of synthetic jet actuators () having at least one member and being in fluidic communication with said first set of flow paths; and (e) a set of LEDs () containing at least one member and being in thermal contact with said heat sink.

Light fixture with multiple LEDs and synthetic jet thermal management system

A method for calibrating a synthetic jet ejector is provided. The method includes (a) taking a first measurement DCRof the DC resistance of the coil; (b) adjusting the actuator drive voltage Vto achieve a desired maximum displacement dat a frequency f; (c) measuring the input current Iand input voltage V; (d) calculating the back electromagnetic frequency B, wherein B=V&#x2212;I*DCR; and (e) storing the calculated value of Bin a memory device associated with the synthetic jet actuator.

Method and apparatus for controlling diaphragm displacement in synthetic jet actuators

A thermal management system (), comprising (a) a synthetic jet actuator (), and (b) a processor () in communication with the synthetic jet actuator, the processor being adapted to receive programming instructions, and being further adapted to modify the operation of the synthetic jet actuator in response to the programming instructions.

Electronics package for synthetic jet ejectors

A system is provided herein which comprises (a) a plurality of circuit boards (); (b) a plurality of slots (), wherein each of said slots is adapted to provide power to a circuit board coupled thereto, and wherein each of said circuit boards is coupled to one of said slots; and (c) a thermal management card () disposed in one of said slots, said thermal management card containing at least one synthetic jet ejector.

Thermal management system for card cages

A wafer position error detection and correction system determines the presence of a wafer on a wafer transport robot blade. The system also determines a wafer position error by monitoring the position of the wafer with respect to the blade with one sensor which is located proximate to each entrance of a process chamber. When a wafer position error is detected, the system determines the extent of the misalignment and corrects such misalignment if correctable by the wafer transport robot or alerts an operator for operator intervention. The system incorporates a transparent cover on the surface of the wafer handling chamber and four optical detection sensors disposed on the surface of the transparent cover, in which each sensor is placed proximate to the entrance of the process chamber. In addition, an I/O sensor is placed adjacent the I/O slit valve to detect and correct wafer position errors. The detection sensors direct light through the wafer handling chamber to reflectors on the floor of the transfer chamber which reflect the light back to the detector sensors. A detector within the detector sensor detects when the beam path from the position sensor to the reflector is uninterrupted. As a wafer is retracted out of a process chamber or a wafer cassette, the position of the wafer with respect to the blade is measured, thus determining whether the wafer is properly placed on the wafer.

Wafer position error detection and correction system

A method for forming a spatial light modulator (SLM) comprises forming a substrate (10) underneath a layer of Ferro-Electric crystal material (14) with a plurality of mirrored elements (12) disposed on the surface thereof. The process involves forming a layer of low stress oxide on the surface of the substrate over control pads or conductive strips (24) which are connected to underlying control elements. Openings (30) are formed in the oxide, followed by a formation of a conformal layer of aluminum (32). This is etched to form plugs (36) and then the substrate is subjected to a chemical/mechanical planarization step. This involves polishing the substrate to provide an optically flat surface. Thereafter, a layer of aluminum is then disposed on the surface of the substrate, patterned and etched to form the mirrored elements (12).

Method for forming a ferroelectric spatial light modulator utilizing a

Method for forming a ferroelectric liquid crystal spatial light

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Austin, TX, United States of America

John Stanley Booth