Kla Corporation

Abb Schweiz Ag

John Savee

Gildardo Rios Delgado

Evgeniia Butaeva

Matthew Derstine

Grace H Chen

J Brian Leen

Gary V Lopez Lopez

Raphael N Desbiens

Paul Christopher Hansen

Kyle Owen

Dmitry Skvortsov

Serguei Likhanski

Vera (Guorong) Zhuang

A material recovery system for an optical component includes a reservoir containing gas and configured to supply a gas flow containing the gas. The material recovery system also includes an ion beam generator disposed on the reservoir and configured to receive the gas flow and to ionize the gas in the gas flow to generate an ion beam. The ion beam is configured to be directed to the optical component to remove at least a portion of a F-containing optical material degraded by exposure to VUV radiation, DUV radiation, and/or photo-contamination.

Material recovery systems for optical components

Systems and methods for skewed basis set fitting may include obtaining measured absorption data indicative of an amount of absorption of light by a sample gas at each of multiple frequencies, determining an absorption dependent cavity time constant indicative of a skew to the measured absorption data caused by light reflections within a cavity in which the sample gas is contained, obtaining reference absorption data including basis sets indicative of reference amounts of light absorbed by each of multiple gases at each of the multiple frequencies, skewing the reference absorption data based on the absorption dependent cavity time constant to generate skewed reference absorption data, and fitting the measured absorption data to the skewed reference absorption data to identify an amount of at least one constituent gas within the sample gas.

Systems and methods for skewed basis set fitting

A system for mitigating damage to optical elements caused by vacuum ultraviolet (VUV) light exposure is disclosed. The system includes a light source configured to generate VUV and a chamber containing one or more gaseous fluorine-based compounds of a selected partial pressure. The system includes one or more optical elements. The one or more optical elements are located within the chamber and are exposed to the one or more gaseous fluorine-based compounds. The VUV light generated by the light source is of sufficient energy to dissociate the fluorine-based compound within the chamber into a primary product.

System and method for protecting optics from vacuum ultraviolet light

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San Francisco, CA, United States of America

John Savee