Kla Corporation

Schlumberger Technologies, Inc.

John Rouse

Christopher Sears

Alan D Brodie

Grace Hsiu-Ling Chen

Neal T Sullivan

Rainer Knippelmeyer

Ira Rosenberg

Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

Field curvature correction for multi-beam inspection systems

In order to improve the resolution of an electron beam in a scanning electron microscope or the like in which a Wien filter is employed for particle detection purposes, the beam is caused to have an envelope with a crossover point within, and preferably centrally located with respect to, the Wien filter.

Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like

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Mitcham, United Kingdom

John Rouse