Adesto Technologies Corporation

Adesto Technologies France Sarl

John Ross Jameson

Shane Charles Hollmer

John Dinh

Foroozan Sarah Koushan

Nad Edward Gilbert

Derric Lewis

Jeffrey Allan Shields

Michael Allen Van Buskirk

Venkatesh P Gopinath

Wei Ti Lee

Ming Sang Kwan

Daniel Wang

Janet Wang

Yi Ma

Mark D Kellam

Chakravarthy Gopalan

Deepak Kamalanathan

Michael Van Buskirk

Juan Pablo Saenz Echeverry

Antonio R Gallo

David Kim

Philippe Blanchard

An integrated circuit device can include a plurality of nonvolatile memory elements having values that vary randomly or pseudo-randomly from one another; a selection circuit configured to select a plurality of nonvolatile memory elements that vary randomly or pseudo-randomly in response to a received challenge value; and sense circuits configured to generate a response value based on the values of the selected nonvolatile memory elements. Related methods and systems are also disclosed.

Pseudo physically unclonable functions (PUFS) using one or more addressable arrays of elements having random/pseudo-random values

A method of controlling a resistive switching memory cell can include: receiving a first command to be executed on the resistive switching memory cell; performing, in response to the first command, an erase operation to erase the resistive switching memory cell to an erased state; verifying the erased state of the resistive switching memory cell; performing a weak program operation to program the resistive switching memory cell to a first programmed state; and verifying the first programmed state of the resistive switching memory cell.

Dual program state cycling algorithms for resistive switching memory device

In one embodiment, a capacitive circuit can include: (i) a resistive storage element having a solid electrolyte, a first electrode coupled to a first side of the solid electrolyte, and a second electrode coupled to a second side of the solid electrolyte; (ii) the resistive storage element being configured to be programmed to a low resistance state by application of a program voltage in a forward bias direction to form a conductive path between the first and second electrodes, and being configured to be erased to a high resistance state by application of an erase voltage in a reverse bias direction to substantially dissolve the conductive path; and (iii) a first capacitor having the first electrode coupled to a first side of a first oxide layer, and a third electrode coupled to a second side of the first oxide layer.

Capacitor arrangements using a resistive switching memory cell structure

A method can include determining a data value stored in a memory element of a memory cell array based on the length of time required to cause a property of the memory element to change. A memory device can include a plurality of elements programmable into at least two different states; and an electrical bias section that applies sense conditions to a selected element; and a sense section configured to distinguish between the two different states according to whether a change in property occurs in the selected element within a predetermined time under the sense conditions.

Memory devices, circuits and methods having data values based on dynamic change in material property

A memory device, comprising: read circuits coupled to a plurality of memory elements programmable between at least two different resistance states, the read circuits generating output values based on resistance states of selected memory elements in a read operation; and current limit circuits that limit a current flow through each memory element to less than a program threshold current; wherein the program threshold current corresponds to a current that flows through a memory element being programmed to cause its resistance to change to a resistance between that of two different resistance states.

Resistive memory devices, circuits and methods having read current limiting

Structures and methods for control of an operating window of a programmable impedance element are disclosed herein. In one embodiment, a semiconductor memory device can include: (i) a memory array having a programmable impedance element; (ii) a register configured to be programmed with data that represents an erase verify value, a program verify value, and a read trip point resistance value, for the memory array; (iii) a controller configured to determine a mode of operation for the memory array; (iv) a register access circuit configured to read the register to obtain data that corresponds to the mode of operation; and (v) a voltage generator configured to generate a reference voltage based on the register data, where the reference voltage is used to perform an operation on the programmable impedance element corresponding to the mode of operation.

Programmable window of operation for CBRAM

A memory device can include a plurality of memory cells each comprising at least one programmable impedance memory element; a programming circuit coupled to the memory elements and configured to apply at least one time varying pulse to memory elements to place them into one of at least two different impedance states; and a programming voltage source coupled to the programming circuit configured to generate the at least one time varying pulse; wherein the time varying pulse decreases and increases in potential while having an overall increase in one voltage polarity.

Circuits and methods for programming variable impedance elements

A programmable memory element can include an insulating layer formed over a bottom structure; an opening formed in the insulating layer; a sidewall structure formed next to side surfaces of the opening; a tapered structure formed within the opening adjacent to the sidewall structure; and a solid electrolyte forming at least a portion of a structure selected from: the bottom structure, the sidewall structure, and the tapered structure.

Programmable memory elements, devices and methods having physically localized structure

In accordance with an embodiment of the present invention, a resistive switching device comprises a bottom electrode, a switching layer disposed over the bottom electrode, and a top electrode disposed over the switching layer. The top electrode comprises an alloy of a memory metal and an alloying element. The top electrode provides a source of the memory metal. The memory metal is configured to change a state of the switching layer.

Resistive switching devices having alloyed electrodes and methods of formation thereof

A memory device can include a plurality of programmable elements; at least one sense circuit that generates sense data values from detected impedances of accessed programmable elements; and at least one data store circuit that stores initial data values from the at least one sense circuit, and stores output data values from the at least one sense circuit after check conditions have been applied to at least one programmable element. The check conditions can induce a change in impedance for programmable elements programmed to at least one predetermined state. Methods can include reading data from at least one memory cell of a memory device comprising a plurality of such memory cells; if the read data has a first value, providing such data as an output value; and if the read data has a second value, repeating access to the memory cell to confirm the read data value.

Read methods, circuits and systems for memory devices

A memory device can include at least one cathode formed in first opening of a first insulating layer; at least one anode formed in a second opening of second insulating layer, the second insulating layer being a different vertical layer than the first insulating layer; and a memory layer comprising an ion conductor layer extending laterally between the at least one anode and cathode on the first insulating layer, the ion conductor layer having a thickness in the vertical direction less than a depth of the first opening.

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Burlingame, CA, United States of America

John Ross Jameson