Sandia Corporation

Kla Tencor Corporation

Sandia National Laboratories

John R Torczynski

Daniel John Rader

Michail A Gallis

Gildardo Rios Delgado

Leonard Elliott Klebanoff

Patrick V Brady

Charles R Bryan

John E Brockmann

Carlton F Brooks

Rudy Flores Garcia

Frank Chilese

Karl Wally

Anthony S Geller

Daniel C Wack

Francis Chilese

Richard A Neiser

Mark F Smith

Ronald C Dykhuizen

Daniel S Rader

An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.

Particle and chemical control using tunnel flow

An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

Methods and apparatus for use with extreme ultraviolet light having contamination protection

A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal diffusers in the form of showerheads to provide a continual flow of clean gas. The main showerhead bathes the reticle surface to be inspected in smoothly flowing, low pressure gas, isolating it from particles coming from surrounding volumes. The secondary showerhead faces away from the reticle and toward the EUV illumination and projection optics, supplying them with purge gas while at the same time creating a buffer zone that is kept free of any particle contamination originating from those optics.

Particle control near reticle and optics using showerhead

A process and apparatus for separating a gas mixture comprising providing a slot in a gas separation channel (conceptualized as a laterally elongated Clusius-Dickel column), having a length through which a net cross-flow of the gas mixture may be established; applying a higher temperature to one side of the channel and a lower temperature on an opposite side of the channel thereby causing thermal-diffusion and buoyant-convection flow to occur in the slot; and establishing a net cross-flow of a gas mixture comprising at least one higher density gas component and at least one lower density gas component along the length of the slot, wherein the cross-flow causes, in combination with the convection flow, a spiraling flow in the slot; and wherein the spiral flow causes an increasing amount of separation of the higher density gas from the lower density gas along the length of the channel. The process may use one or more slots and/or channels.

Process and apparatus for separation of components of a gas stream

An aerosol lab-on-a-chip (ALOC) integrates one or more of a variety of particle collection, classification, concentration (enrichment), an characterization processes onto a single substrate or layered stack of such substrates. By mounting a UV laser diode laser light source on the substrate, or substrates tack, so that it is located down-stream of the sample inlet port and at right angle the sample particle stream, the UV light source can illuminate individual particles in the stream to induce a fluorescence response in those particles having a fluorescent signature such as biological particles, some of said particles. An illuminated particle having a fluorescent signal above a threshold signal would trigger a sorter module that would separate that particle from the particle stream.

Apparatus to collect, classify, concentrate, and characterize gas-borne particles

An aerosol lab-on-a-chip (ALOC) integrates one or more of a variety of aerosol collection, classification, concentration (enrichment), and characterization processes onto a single substrate or layered stack of such substrates. By taking advantage of modern micro-machining capabilities, an entire suite of discrete laboratory aerosol handling and characterization techniques can be combined in a single portable device that can provide a wealth of data on the aerosol being sampled. The ALOC offers parallel characterization techniques and close proximity of the various characterization modules helps ensure that the same aerosol is available to all devices (dramatically reducing sampling and transport errors). Micro-machine fabrication of the ALOC significantly reduces unit costs relative to existing technology, and enables the fabrication of small, portable ALOC devices, as well as the potential for rugged design to allow operation in harsh environments. Miniaturization also offers the potential of working with smaller particle sizes and lower pressure drops (leading to reduction of power consumption).

A new type of aerodynamic particle beam generator is disclosed. This generator produces a tightly focused beam of large material particles at velocities ranging from a few feet per second to supersonic speeds, depending on the exact configuration and operating conditions. Such generators are of particular interest for use in additive fabrication techniques.

Aerodynamic beam generator for large particles

A module bay requires less cleanroom airflow. A shaped gas inlet passage can allow cleanroom air into the module bay with flow velocity preferentially directed toward contaminant rich portions of a processing module in the module bay. Preferential gas flow direction can more efficiently purge contaminants from appropriate portions of the module bay, allowing a reduced cleanroom air flow rate for contaminant removal. A shelf extending from an air inlet slit in one wall of a module bay can direct air flowing therethrough toward contaminant-rich portions of the module bay, such as a junction between a lid and base of a processing module.

Module bay with directed flow

A spin coating apparatus requires less cleanroom air flow than prior spin coating apparatus to minimize cleanroom contamination. A shaped exhaust duct from the spin coater maintains process quality while requiring reduced cleanroom air flow. The exhaust duct can decrease in cross section as it extends from the wafer, minimizing eddy formation. The exhaust duct can conform to entrainment streamlines to minimize eddy formation and reduce interprocess contamination at minimal cleanroom air flow rates.

Spin coating apparatus

An opposed-flow virtual cyclone for aerosol collation which can accurately collect, classify, and concentrate (enrich) particles in a specific size range. The opposed-flow virtual cyclone is a variation on the virtual cyclone and has its inherent advantages (no-impact particle separation in a simple geometry), while providing a more robust design for concentrating particles in a flow-through type system. The opposed-flow virtual cyclone consists of two geometrically similar virtual cyclones arranged such that their inlet jets are inwardly directed and symmetrically opposed relative to a plane of symmetry located between the two inlet slits. A top plate bounds both jets on the 'top' side of the inlets, while the other or lower wall curves 'down' and away from each inlet jet. Each inlet jet will follow the adjacent lower wall as it turns away, and that particles will be transferred away from the wall and towards the symmetry plane by centrifugal action. After turning, the two jets merge smoothly along the symmetry line and flow parallel to it through the throat. Particles are transferred from the main flows, across a dividing streamline, and into a central recirculating region, where particle concentrations become greatly increased relative to the main stream.

Growing community of inventors

Albuquerque, NM, United States of America

John R Torczynski