Other

Bio-rad Laboratories, Inc.

The University of New Mexico

John R McNeil

George J Collins

Scott Richard Wilson

Zeng-gi Yu

S Sohail Naqvi

Kenneth P Bishop

Kirt C Hickman

Susan M Gaspar

Steven Roy Julien Brueck

Bruce L Draper

Zeng-qi Yu

Brian R Stallard

Gary D Tipton

Lisa M Milner

Richard H Krukar

An optical scatterometer system enables analysis of a sample material at various wavelengths without rotating or otherwise moving the sample material.

Method for broad wavelength scatterometry

The present invention includes a method and apparatus for the rapid, nondestructive evaluation of the contrast of a latent image in a photoresist. More particularly, the contrast of the latent image is directly monitored by measuring the intensity of the light diffracted from a pattern in the exposed, undeveloped photoresist known as the latent image. The proper exposure tool parameters, such as exposure tool time and focus, is suitably determined based on the intensity of different orders of diffracted light, namely the 2nd-order diffracted from the latent image. In a preferred embodiment, a test pattern consisting of a periodic pattern, or a pattern of the device associated with the particular lithographic step, is employed to provide well-defined diffraction orders.

Use of diffracted light from latent images in photoresist for optimizing

An optical scatterometer system enables illumination of a sample material at various angles of incidence without rotating or otherwise moving the sample material.

Lens scatterometer system employing source light beam scanning means

In microelectronics manufacturing, an arrangement for monitoring and control of exposure of an undeveloped photosensitive layer on a structure susceptible to variations in optical properties in order to attain the desired critical dimension for the pattern to be developed in the photosensitive layer. This is done by ascertaining the intensities for one or more respective orders of diffracted power for an incident beam of radiation corresponding to the desired critical dimension for the photosensitive layer as a function of exposure time and optical properties of the structure, illuminating the photosensitive layer with a beam of radiation of one or more frequencies to which the photosensitive layer is not exposure-sensitive, and monitoring the intensities of the orders of diffracted radiation due to said illumination including at least the first order of diffracted radiation thereof, such that when said predetermined intensities for the diffracted orders are reached during said illumination of photosensitive layer, it is known that a pattern having at least approximately the desired critical dimension can be developed on the photosensitive layer.

Diffracted light from latent images in photoresist for exposure control

An optical scatterometer system includes a screen positioned to receive and display a pattern representative of light specularly reflected and scattered from an illuminated sample material and a camera positioned to record the pattern displayed on the screen. The screen may present a curved surface to increase its light gathering capabilities and may be constructed of an electron trapping material, a photochromic material or a pyrochromic material. The screen may contain one or more apertures for passing one or more incident light beams generated by a light source and/or light specularly reflected and scattered from the sample material. The screen may be positioned between the sample material and the light source, or the sample material may be positioned between the screen and the light source.

Two-dimensional optical scatterometer apparatus and process

For critical dimension (CD) metrology of photomasks, a laser scatterometer linewidth measurement tool provides noncontact rapid, and nondestructive measurement of linewidth. Calculation of the linewidth is based on a rigorous theoretical model, thus eliminating the need for calibrations. A chrome-on-glass diffraction grating is illuminated with a laser. A photodetector mounted behind the photomask measures the scattered power in each diffracted order. This provides data for the rigorous theoretical model which provides a relationship between the linewidth of the photomask grating and the fraction of total power diffracted into the transmitted zero-order. This scatterometer linewidth measurement technique provides a simple, rapid, nondestructive, and noncontact method of linewidth determination which takes into account the effect of the glass substrate on which the grating is placed. This technique is insensitive to variations in angle of incidence, spot size, position of the spot on the grating, polarization and wavelength.

Simple CD measurement of periodic structures on photomasks

A single-chamber apparatus and method are described for in-situ generation of dangerous polyatomic gases and radicals from solid or liquid source materials contained within a porous foamed structure. A cooled cathode is provided for establishing a plasma discharge within the chamber, and a heat source is provided to maintain the porous foamed structure within a fixed temperature range chosen such that the source material is removed from the porous foamed structure by evaporation induced by heat from the heat source while at the same time preventing consumption by evaporation of the porous foamed structure itself.

Single-chamber apparatus for in-situ generation of dangerous polyatomic

Apparatus for depositing and tailoring anisotropic properties of ceramic oxide-superconductor films onto the outer surface of fibers, wires, rods, and bars and onto the inner surface of tubes, as well as onto the surface of disc-shaped substrates, employs first and second vacuum chambers, a cylindrical magnetron structure positioned within the first vacuum chamber, a disc-shaped cold cathode positioned within the first vacuum chamber for providing a beam of energetic electrons for injection into a plasma region of the cylindrical magnetron structure, and a ring-shaped cold cathode positioned within the second vacuum chamber for providing a disc-shaped beam of electrons impinging upon the deposited film for annealing it. The magnetron cathodes comprise either single metal elements or mixtures thereof. A planar magnetron and a line-shaped cold cathode that produces an electron beam impinging on the surface of a planar substrate to provide a uniform strip heat zone are employed for depositing superconducting thin films of metal oxide ceramic materials onto the surface of wide area planar substrates.

Magnetron deposition of ceramic oxide-superconductor thin films

In-situ generation of dangerous polyatomic gases is achieved by providing a solid elemental or compound source, one or more gaseous feedstock sources, a plasma generated in a partial vacuum, and beam impingement on the target to rapidly evolve the elemental species of interest. The toxic, corrosive, and explosive gas so generated in-situ can be better handled safely with lower operating cost.

Apparatus and method for in-situ generation of dangerous polyatomic

The disclosure relates to maskless deposition and etching and more particularly to maskless deposition and etching of the surface of objects using single and multiple ion sources.

Method and apparatus for ion deposition and etching

Apparatus for coating optical fibers with thin hermetic films based on cylindrical magnetron reactive sputtering and charged particle assisted deposition is disclosed. The thin film coated on the fiber is composed of material sputtered from a cylindrical cathode as well as material from reactive feedstock gases. The cylindrical cathode insures uniform deposited film thickness on a cylindrical fiber at high deposition rates. A cylindrical inner extraction grid acts to create ion or electron bombardment of the outer surface of the fiber as it is coated. As a consequence of the enclosed cylindrical geometry, the high magnetron sputtering rate, and the in-situ charged particle bombardment, hermetic coatings of high quality may be placed on fibers pulled through the deposition apparatus at rates of 1-20 meters/second. An external laser beam directed along the longitudinal axis of the cylindrical magnetron may be employed to improve the coating process.

Method and apparatus for hermetic coating of optical fibers

A method for depositing and tailoring anisotropic properties of ceramic oxide superconductive films onto the outer surface of fibers, wires, rods, bars and onto the inner surface of tubes, as well as onto the surface of disc-shaped substrates, employs either tandem magnetron discharges alone or both an abnormal glow cold cathode electron gun together with tandem magnetron discharges. This deposition method provides uniform thin films having high growth rates, controllable stoichiometry and desired anisotropic microstructure. The magnetron cathodes are made from either mixtures or single elements of the metals. The oxygen component is achieved either from the cathode material itself or by reactive sputtering in an oxygen ambient or a post-deposition thermal or plasma oxidation. An external electron beam may also be used for in-situ annealing of the deposited films while placed under an external applied magnetic field to better align crystals in the films for the desired anisotropic superconducting properties. Thin metal or dielectric thin films are deposited as an interface layer and are placed both on the top of and under the metal oxide ceramic superconductive film material. Hermetic seal layers are deposited to protect the ceramic oxide superconductive films from being poisoned by foreign atoms.

The disclosure relates to a method and apparatus using ion etching and ion assisted deposition to reform a surface of an object, such as a large lens, from its existing topography to a predetermined topography. The method comprises comparing the existing topography of the surface of the object to the predetermined topography. In one embodiment, the comparison can be used to distinguish objects having surfaces which are readily or economically reformable to the predetermined topography from those which are not suitable for such reforming. The method novelly utilizes an algorithm comprising image restoration. The ion etching structure of the apparatus comprises an ion source grid which can be used to provide an ion beam of a preselected spatial distribution. The grid is constructed of a nonconducting, vacuum compatible material, such as a ceramic sheet coated with a conductive layer on each side. Apertures are drilled through the grid in a selected pattern. The ion beam produced from a plasma source when a suitable voltage is applied across the coatings has a spatial distribution in accordance with the aperture pattern. In one embodiment the coatings comprise discrete corresponding areas on each surface and different voltages are appliable to each area to further control beam spatial distribution. Ion assisted deposition may be simultaneously performed under the algorithm to add material to the surface in accordance with the desired predetermined topography.

Method and apparatus for ion etching and deposition

A gas ion laser employs a direct current electron beam to create a rare gas ion density and a cylindrical magnetron to sputter a partial pressure of metal vapor density and to also create a rare gas ion density. Thermal energy charge transfer selectively pumps the upper metal ion laser transitions on a continuous wave basis.

Ultraviolet metal ion laser

An improved optical scatterometer includes a multiple detector array that enables the measurement of sample microstructure over an increased range of spatial frequency. One array of optical detectors is positioned in a plane perpendicular to the plane containing an incident laser beam and a specularly reflected beam to detect indications of back-scattered and forward-scattered light in that perpendicular plane. Two laser beams having different wavelengths may be employed to determine the optical characteristics of a film and an underlying substrate.

Growing community of inventors

Albuquerque, NM, United States of America

John R McNeil