Eastman-kodak Company

John R Fyson

Edward C Glover

Gareth B Evans

Christopher B Rider

Anthony Earle

Peter D Marsden

Peter Hewitson

Peter J Twist

John M Higgins

Martyn S Glover

Sean D Slater

Adrian J Codling

Ronald S Cok

John A Agostinelli

Elena A Fedorovskaya

Jeffrey L Hall

Nigel R Wildman

Louis Elbert Friedrich

David T Clarke

Paul C Ward

Robert A Arcus

Roland G Willis

Christopher John Winscom

Michael Ridgway

Philip J Coldrick

Eric R Brown

Jon A Kapecki

Jurjen Frederik Winkel

David M Henson

Gerald I Levenson

Andrew R Benoy

David N Rogers

Helen M Redfearn

Janet Linda Menton

A thin film electronic device fabrication process includes providing an electronic device on a substrate, a first reactant gaseous material, a second reactant gaseous material, an inert gaseous material; and a delivery head through which the reactant gaseous materials and the inert gaseous material are simultaneously directed toward the electronic device and the substrate. One or more of the reactant gaseous materials and the inert gaseous material flows through the delivery head. The flow of the one or more of the reactant gaseous materials and the inert gaseous material generates a pressure to create a gas fluid bearing that maintains a substantially uniform distance between the delivery head and the substrate. Relative motion between the delivery head and the substrate causes the second reactant gaseous material to react with at least a portion of the electronic device and the substrate that has been treated with the first reactant gaseous material.

Thin film electronic device fabrication process

The invention relates to a method of making a planographic printing plate comprising a substrate having thereon one or more layers of a radiation-sensitive metal oxide, sulfide or nitride and excluding an organic hydrophobic material or a binder within or above a radiation-sensitive layer, the method comprising depositing the one or more layers of the radiation-sensitive metal oxide, sulfide or nitride by vapor deposition and exposing the one or more layers without that exposure causing ablative effect. Preferably the compound, and in particular a metal oxide, such as titanium dioxide, is deposited by atomic layer deposition at atmospheric pressure and at a temperature of from 20&#xb0; C. to 300&#xb0; C. at a layer thickness of less than 100 nm. The substrate can be any planar material, preferably with the potential to be flexible and with a surface that can be roughened or textured. No binder is required to adhere the metal compound to the printing plate and no processing or chemicals are required in the preparation of the plate.

Method of making a planographic printing plate

A multiple layer photosensitive element having at least three differently sensitised photosensitive layers on one side of a support, such as a, transparent flexible support, is imagewise exposed according to a desired circuit pattern and developed to form two layers of conductive track patterns from each photosensitive layer, which may then be connected together by forming vias by drilling or in situ generation. The resulting multiple layer conductive element has application in the field of printed circuit board manufacture or as the backplane electronic element of a flexible display device.

Method of forming flexible electronic circuits

A method of producing an address plate comprising the steps of; coating a layer of conducting inorganic material onto a substrate, coating a layer of photoresist above this layer of conductive material and curing this layer, exposing, through a mask, the desired pattern of the conductors onto the layer of photoresist, developing the photoresist and etching the layer of the conductive material and coating the resulting etched layer with a layer of dielectric material. A further layer of photoresist is then applied, the thickness of this layer being equal to the desired height of a relief pattern, curing the further layer of photoresist, exposing, through a second mask, the desired structure of the relief pattern onto the layer of photoresist, developing the photoresist and allowing the layer to dry. This results in spacers raised above the layer of dielectric material.

Method of making an address plate

A method of producing a patterned mirror on a transparent conductive substrate comprises the steps of; coating a layer of conductive material onto a substrate, coating a layer of metal onto the layer of conductive material, coating a layer of photoresist onto the layer of metal, curing the layer of photoresist, exposing a desired pattern of transparent conductors through a first mask onto the layer of photoresist, developing the photoresist and simultaneously etching the layer of the conductive material and the layer of metal, exposing a desired pattern of metal conductors through a second mask onto the remaining layer of photoresist, developing the photoresist and etching the layer of metal.

Method of forming a patterned conductive structure

A patterned electrical conductor having improved conductivity and controllably high resolution track and gap widths is obtained by exposing, to a desired conductive pattern, a pressure-sensitive or photosensitive element comprising a support and a pressure-sensitive or photosensitive material coated thereon being sensitive to the exposure (e.g. the wavelength of exposing radiation) and capable of providing a latent image upon exposure, and then developing the exposed element to form a developed element having a metal (e.g. silver) image thereon and then electroless plating and/or electroplating the metal image with a second metal (e.g. silver) whilst subjecting the developed element to ultrasonic agitation.

Method of forming conductive tracks

A method of producing a relief structure on a patterned conductor comprises the steps of; coating a layer of conductive material onto a transparent substrate, coating a layer of metal onto the layer of conductive material, coating a layer of photoresist onto the layer of metal, curing the layer of photoresist, exposing a desired pattern of transparent conductors through a first mask onto the layer of photoresist, developing the photoresist and simultaneously etching the layer of the conductive material and the layer of metal, exposing a desired pattern of metal conductors through a second mask onto the remaining layer of photoresist, developing the photoresist and etching the layer of metal, applying a further layer of photoresist, curing the further layer of photoresist, exposing the further layer of photoresist thorough the substrate, developing the photoresist and allowing the layer to dry, resulting in a pattern of spacers/reliefs in registration with the metal conductors.

Method of registering a spacer with a conducting track

The application, according to a desired image, of an absorbance controlling composition to a receiver having an imaging layer comprising a radiation absorbing component, such as a dye or pigment, with spectral absorbance properties susceptible to change on treatment with the absorbance controlling composition provides a method of imaging by which a desired image may be formed on the receiver, for example by jetting a solution of the absorbance controlling composition onto the receiver.

Method of imaging

Partially oxidized polyalkyleneimine antioxidant for photographic developers

A method of chemically marking photosensitive material that needs to be digitally scanned and adjusted rather than optically printed to produce a satisfactory hardcopy.

Processing of photographic material

Method of treating waste effluent

A method of processing photosensitive materials in which one or more chemical compounds are at least partially retained after processing. The chemical compounds are unique to a particular process used by a copyright owner. The absence of the unique compounds in a processed material thus indicates that the processing has been without the authorization of the copyright owner.

Protection of photographic material

A photographic washing bath comprises a chamber containing a wash solution for a silver halide photographic material having a pH of less than 7 and comprising water having dissolved therein an oxidizing agent, said oxidizing agent having an oxidizing potential of at least 1 volt and being in a concentration of from 0.05 to 2 Molar. The oxidation potential of the oxidizing agent is preferably at least 1.2 volts and may be hydrogen peroxide or a source of hydrogen peroxide, a persulphate, a perborate, a bromate, or an iodate. A washing process using the invention is suitable for being carried out in same chamber as the development and fixing stages in which case hydrogen peroxide is the preferred oxidizing agent because any peroxide remaining at the end of the wash stage can be removed by evaporation, thereby avoiding risk of contamination of the next stage to be carried out in the chamber.

Photographic wash solution and process

Method of producing a photographic image

A method of processing a silver halide photographic material comprises passing the material through a processing solution repeatedly at a temperature suitable for processing, the material spending the major part of the processing time out of the liquid, wherein said processing solution has a viscosity from 0.7 to 5 cP at the processing temperature.

Processing photographic material

Growing community of inventors

Hackney, United Kingdom

John R Fyson