Arch Specialty Chemicals, Inc.

John P Hatfield

Andrew J Blakeney

J Thomas Kocab

Ognian N Dimov

Lawrence Ferreira

Gregory Domenic Spaziano

David J Brzozowy

Lawerence Ferreira

Radiation sensitive compositions for use in producing a patterned image on a substrate comprise:

Photoresist compositions

A photoacid compound having the following general structure:R&#x2014;O(CF)SOXwherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C-Clinear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF)O)(CF)&#x2014; wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.

Photoacid generators for use in photoresist compositions

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Hope Valley, RI, United States of America

John P Hatfield