Steag Micro Tech Gmbh

John Oshinowo

Martin Weber

A method and apparatus for treating substrates in a fluid container with at least one fluid and ultrasound provided. Each of two oppositely disposed walls of the fluid container are provided with at least two ultrasound radiation areas that can be respectively individually activated. The ultrasound radiation areas of one of the container walls is activated in a chronological relationship to the ultrasound radiation areas of the other container wall in such a way that oppositely disposed ultrasound radiation areas of the container walls are not activated simultaneously.

Method and apparatus for treating substrates

A device for the treatment of substrates ( ) has a container having a bottom and being filled with a treatment fluid. The treatment fluid streams in from below through the bottom of the container. At least two inlet tubes are provided for the treatment fluid underneath the container bottom. Each of the at least two inlet tubes is provided with projecting comb-like distribution channels. The at least two inlet tubes and the distribution channels are arranged in a common plane. The distribution channels of one of the at least two inlet tubes are respectively positioned between two of the distribution channels of the other one of the two inlet tubes.

Substrate treatment device

A device for the treatment of substrates has a container having walls and being filled with a treatment fluid. At least one substrate carrier is mounted in the container so as to move the substrates vertically in a reciprocating manner without a substrate support. Substrate side walls are provided between the substrates and the container walls. These substrate side walls extend parallel to the substrates and are vertically movable in a reciprocating manner with the substrates.

A treatment apparatus for treating substrates includes a fluid container and a device for moving in a reciprocating manner the substrates within the fluid container during treatment to thereby make accessible areas of the substrates that would otherwise be obstructed by parts of the device.

Device for treating substrates in a fluid container

An apparatus for processing substrates is provided. The apparatus includes a receptacle for containing processing fluid, and at least one substrate support. Components of the receptacle and/or substrate support that come into contact with processing fluid have a protective layer. Guide or support members for the substrates are fused to the protective layer.

Substrate processing device

A device for treating substrates includes a fluid container in which the substrates are contained during treatment. A nozzle system is connected to the sidewalls and/or bottom of the fluid container and includes a plurality of nozzles for introducing a fluid into the fluid container.

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Schlaitdorf, Germany

John Oshinowo