Apple Inc.

John Murray Thornton, Iii

Peter N Russell-Clarke

Tang Yew Tan

David A Pakula

Lucy Elizabeth Browning

Charles B Woodhull

Masashige Tatebe

Bryan Patrick Kiple

Thomas Johannessen

Napthaneal Yuen Tan

Julie Hanchak-Connors

Max A Maloney

Patrick S Wieler

Jude Mary Runge

Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.

Double anodized parts

The embodiments described herein relate to anodic oxides and methods for forming anodic oxides. The methods involve incorporating an ultraviolet (UV) light absorbing compounds into anodic oxides to prevent color fading of the anodic oxides caused by exposure to UV light. In some embodiments, the UV light absorbing compound includes para-aminobenzoic acid (PABA). The UV light absorbing compound can be incorporated within the anodic oxide during a sealing process. The UV light absorbing compound becomes infused within a seal layer, which is formed during the sealing process. The resultant anodic oxide has a UV light absorbing seal layer that can block UV light from reaching any underlying colorant existing within the anodic oxide.

Methods for incorporating ultraviolet light absorbing compounds into anodic oxides

Double anodizing processes

Growing community of inventors

Los Gatos, CA, United States of America

John Murray Thornton, Iii