Lumentum Operations LLC

Jds Uniphase Corporation

John Michael Miller

Barrie P Keyworth

Hery Djie

Lu Tian

Yuan Ma

Gonzalo Wills

Graham McKinnon

Michael O'Leary

Paul Colbourne

Wenlin Jin

Mohiuddin Mala

Karen Denise Hendrix

Stephen Bagnald

Joel Milgram

Keith Anderson

Graham Mckinnon

Lijun Zhu

Abdul Jaleel K Moidu

Steven Harold Moffat

Eddie Chiu

David R Hess

Patrick Lu

Xiaowei Guo

Qinghong Du

Chester Murley

Thomas Ducellier

Wei Shi

Ajit Vijay Barve

Lei Yang

Peter David Roorda

Matthew Glenn Peters

Vincent V Wong

Brian Smith

Hao Huang

Benjamin Kesler

Siu Kwan Cheung

Brandon C Collings

Pierre D Wall

Huanlin Zhu

Mohammad Ali Shirazi Hosseini Dokht

Dan Burke

Kevin Wang

Andrew Parks

In some implementations, an optical assembly includes a substrate that includes a thermally conductive core, an IC driver chip that is disposed on a first surface of the substrate, and a VCSEL device that includes an electrically insulated surface that is disposed on the thermally conductive core of the substrate within a cavity formed in the second surface of the substrate. The VCSEL device includes a cathode contact disposed on a surface of the VCSEL device and an anode contact disposed on the surface of the VCSEL device. The VCSEL device includes a plurality of emitters and a microlens component that is disposed over the plurality of emitters on the surface of the VCSEL device.

Optical assembly with a microlens component and contacts on a same surface of a vertical cavity surface emitting laser device

A dot projector may include a vertical-cavity surface-emitting laser (VCSEL). The dot projector may include one or more collimating elements to collimate light emitted by the VCSEL. An effective focal length of the one or more collimating elements may be larger than an optics length of the dot projector. The dot projector may include an optical element including a periodic optical phase function to replicate the light after collimation by the one or more collimating elements and an aberration-correcting phase function to correct spot aberrations in a dot pattern resulting from the tiling or splitting of the light.

Dot projector including hybrid refractive-diffractive optical elements

A VCSEL array may include a semiconductor substrate and a plurality of emitters on the substrate that conforms to an emitter pattern. The emitter pattern may be oriented at a non-zero angle to an edge of the substrate and may comprise two or more unit cells arranged to form the emitter pattern. Each unit cell, of the two or more unit cells, may include a same number of emitters, and the two or more unit cells may be arranged to cause a measurement of misalignment associated with two adjacent unit cells, of the two or more unit cells, to satisfy a misalignment threshold.

Vertical-cavity surface-emitting laser array with a tilted emitter pattern

In some implementations, an emitter module may include an emitter layer including a first emitter array configured to produce a first beam that provides flood illumination, and a second emitter array configured to produce a second beam that provides spot illumination. The emitter module may include a first optics layer, positioned in front of the emitter layer, that includes a first collimating lens positioned in front of the first emitter array, and a second collimating lens positioned in front of the second emitter array. The emitter module may include a second optics layer, positioned in front of the first optics layer, that includes an optical diffuser positioned in front of the first collimating lens, and a beamsplitter grating positioned in front of the second collimating lens.

Integrated flood and spot illuminators

A diffractive optical element may include sub-wavelength period stack-and-gap structured layers providing transmissive phase delay at a wavelength. The sub-wavelength period stack-and-gap structured layers may include a set of thin anti-reflection layers that are index matched to an environment or a substrate over a range of fill factors of the sub-wavelength period.

Diffractive optical element

A transmissive optical element may include a substrate. The transmissive optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The transmissive optical element may include a second anti-reflectance structure for the particular wavelength range formed on the first anti-reflectance structure. The transmissive optical element may include a third anti-reflectance structure for the particular wavelength range formed on the second anti-reflectance structure. The transmissive optical element may include at least one layer disposed between the first anti-reflectance structure and the second anti-reflectance structure or between the second anti-reflectance structure and the third anti-reflectance structure.

Multi-level diffractive optical element thin film coating

A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.

Zoned optical waveplate

An optical element may include a substrate. The optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The optical element may include at least one layer disposed on a portion of the first anti-reflectance structure. The optical element may include a second anti-reflectance structure for the particular wavelength range formed on the at least one layer. A depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure, a first index of refraction of the first anti-reflectance structure, a second index of refraction of the second anti-reflectance structure, and a third index of refraction of the at least one layer may be selected to form a diffractive optical element associated with a particular phase delay for the particular wavelength.

Multi-layer thin film stack for diffractive optical elements

A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.

Thin film total internal reflection diffraction grating for single polarization or dual polarization

A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.

Reflective diffraction grating and fabrication method

A sub-wavelength grating is placed inside a liquid crystal variable optical retarder to reduce polarization dependence of the optical retardation generated by the variable optical retarder. A small thickness of the sub-wavelength grating, as compared to a conventional waveplate, reduces the driving voltage penalty due to the in-cell placement of the sub-wavelength grating.

Variable optical retarder

A sub-wavelength thin-film metal grating is placed inside a liquid crystal variable optical retarder at a selected distance from a reflective electrode to form a reflective half wave plate, thereby reducing polarization dependence of the optical retardation generated by the variable optical retarder. The approach enables to form within the device the reflective half wave plate that is suitably thin without modifying the reflective electrode of the device.

Reflective LC devices including thin film metal grating

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John Michael Miller