E.i. Dupont De Nemours and Company

John Michael Legare

Anestis L Logothetis

Duck Joo Yang

Eric William Thomas

This invention concerns a process for fluorinating a perfluoroelastomer which has previously been crosslinked by exposure to ionizing radiation. The resulting product has reduced outgassing. This makes perfluoroelastomer parts that have undergone the process particularly useful in clean rooms and for semiconductor manufacturing.

Fluorination of radiation crosslinked perfluoroelastomers

Fluoroelastomer compositions with minimal concentrations of extractable metal species exhibit excellent performance characteristics under conditions requiring exceptional purity.

High purity fluoroelastomer compositions

Perfluoroelastomer compositions substantially free of elemental carbon, having selected metallic reinforcing filler and titanium dioxide, when cured, exhibit excellent performance characteristics in dry process semiconductor sealing applications.

Perfluoroelastomer compositions

Pellicles having films bearing at least one coating of perfluoropolymers as an antireflective surface, the perfluoropolymers comprising a low molecular weight perfluoropolymer having randomly copolymerized units of tetrafluoroethylene, perfluoro (alkyl vinyl) ether and a cure site monomer, the cure site monomer selected from the group consisting of vinylidene fluoride, perfluoro-(8-cyano-5-methyl-3,6-dioxa-1-octene), bromotetrafluorobutene or perfluoro (2-phenoxypropyl vinyl ether). Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits.

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Newark, DE, United States of America

John Michael Legare