Spts Technologies Limited

Spp Process Technology Systems UK Limited

John MacNeil

Paul G Bennett

Carl Brancher

Martin Ayres

Trevor Thomas

Robert Trowell

Carl David M Brancher

An apparatus for electrochemically processing a semiconductor substrate includes a processing chamber of the type that is sealable to a peripheral portion of a semiconductor substrate so as to define a covered processing volume. The semiconductor substrate is supported by a substrate support. A magnetic arrangement is disposed outside of the processing chamber and produces a magnetic field. The magnetic field is changed using a controller for controlling the magnetic arrangement. An agitator is disposed within the processing chamber. The agitator comprises a magnetically responsive element which is responsive to changes in the magnetic field of the magnetic arrangement so as to provide a reciprocating motion to the agitator.

Apparatus and method for processing a substrate

This invention relates an ion beam source () for use with a non-electrical conducting target () including a grid () for extracting ions and a power supply for supplying pass power to the grid () to extract the ions.

Ion beam source

A method is for processing a substrate. The method includes placing the substrate in a process volume and introducing a process gas or vapor into the process volume and/or subsequently removing gas or vapor from the volume. The step of introducing and/or removing the gas is at least partially performed by moving a movable wall to change the process volume in an appropriate sense.

Positive displacement pumping chamber

Growing community of inventors

Vale of Glamorgan, United Kingdom

John MacNeil