Applied Materials, Inc.

Applied Komatsu Technology, Inc.

Other

Rally Accessories, Inc.

Rally Manufacturing, Inc.

Applied Material, Inc.

John M White

Soo Young Choi

Shinichi Kurita

Robin L Tiner

Beom Soo Park

Suhail Anwar

Wendell T Blonigan

Tae Kyung Won

Carl A Sorensen

Jozef Kudela

Kam S Law

Dan Maydan

Quanyuan Shang

Shijian Li

Gaku Furuta

David N Wang

Manoocher Birang

Dong-Kil Yim

Makoto Inagawa

Ramin Emami

Kenneth S Collins

Sasson Roger Somekh

Fred Conrad Redeker

Ilya Perlov

Salvador P Umotoy

Norman L Turner

Cissy S Leung

Qunhua Wang

John A Adamik

Ernst Keller

Seon-Mee Cho

David Eric Berkstresser

Benjamin M Johnston

Zuoqian Wang

Mei Yin Chang

Robert Jan Visser

Akihiro Hosokawa

Michael N Sugarman

Takako Takehara

Lawrence M Rosenberg

Michael W Richter

Li Hou

Hung Chih Chen

Yan Ye

Visweswaren Sivaramakrishnan

Tsutomu Tanaka

Lizhong Sun

Phillip R Sommer

Robert Z Bachrach

Charles N Dornfest

James V Tietz

Emanuel Beer

James Craig Hunter

Robert I Greene

Janusz Jozwiak

Ki Woon Kim

Christopher Dennis Bencher

Brian J Brown

Thomas L Laidig

Matthias Brunner

Manivannan Thothadri

Gary C Ettinger

Ralf Schmid

Hung T Nguyen

Takayuki Matsumoto

James Hoffman

Bassam Shamoun

Shreesha Y Rao

Yong Kee Chae

William Norman Sterling

Govelio R Gonzalez

Fayez E Abboud

Sriram Krishnaswami

Chung-Hee Park

Hong Soon Kim

Han Byoul Kim

Larry Chang

Jang Fung Chen

Alexander N Lerner

Stan D Tsai

Fritz C Redeker

Kevin P Fairbairn

Jun Zhao

Dieter Haas

Tom K Cho

David K Cheng

Mehran Behdjat

Bradley Owen Stimson

Xin Sheng Guo

Pierre Charet

Anwar Husain

Mark A Fodor

Sanjay D Yadav

Jonghoon Baek

Robert M Robertson

Jerry Yuen Wong

Hongbin Ji

Stefan A Wolff

Sheng Sun

Craig A Bercaw

Roll-aboard travel bag

Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. At least one of the gas passages has a cylindrical shape for a portion of its length extending from the upstream side and a coaxial conical shape for the remainder length of the diffuser plate, the upstream end of the conical portion having substantially the same diameter as the cylindrical portion and the downstream end of the conical portion having a larger diameter.

Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition

In large area plasma processing systems, process gases may be introduced to the chamber via the showerhead assembly which may be driven as an RF electrode. The gas feed tube, which is grounded, is electrically isolated from the showerhead. The gas feed tube may provide not only process gases, but also cleaning gases from a remote plasma source to the process chamber. The inside of the gas feed tube may remain at either a low RF field or a zero RF field to avoid premature gas breakdown within the gas feed tube that may lead to parasitic plasma formation between the gas source and the showerhead. By feeding the gas through an RF choke, the RF field and the processing gas may be introduced to the processing chamber through a common location and thus simplify the chamber design.

RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

A roller garment bag is disclosed that combines and integrates a carry-on and a garment bag into a single luggage case, which obtains the desirable conveniences of carry-on luggage while retaining all of the desirable aspects of a garment bag and a carry-on without introducing any significant detriments to the individual advantages of each style of luggage bag by itself.

Roll-aboard garment bag

Certain exemplary embodiments can provide a cabinet. The cabinet comprises a base and a top. The base has a substantially planar base cap. The top is positioned on the substantially planar base cap of the base. The top has a substantially planar top cap. The top comprises a plurality of electrical outlets and a plurality of Universal Serial Bus ports.

Systems, devices, and/or methods for managing electrical power

Described herein is a substrate carrier comprising electrostatic chuck panels and using the same. The electrostatic chuck panels may include electrodes with interleaved segments. Further, the electrodes of each electrostatic chuck panel may be driven with chucking voltages having opposite polarities.

System and method for residual voltage control of electrostatic chucking assemblies

Device for processing a substrate are described herein. An apparatus for controlling deposition on a substrate can include a chamber comprising a shadow frame support, a substrate support comprising a substrate supporting surface, a shadow frame with a shadow frame body including a first support surface, a second support surface opposite the first surface, and a detachable lip connected with the shadow frame body. The detachable lip can include a support connection, a first lip surface facing the substrate, a second lip surface opposite the first lip surface, a first edge positioned over the first support surface, and a second edge opposite the first edge to contact the substrate.

Flip edge shadow frame

Embodiments described herein generally relate to a temperature control system in a substrate support assembly. In one embodiment, a substrate support assembly is disclosed. The substrate support assembly includes a support plate assembly The support plate assembly includes a first fluid supply manifold, a second fluid supply manifold, a first fluid return manifold, a second fluid return manifold, a plurality of first fluid passages, a plurality of second fluid passages, and a fluid supply conduit. The plurality of first fluid passages extend from the first fluid supply manifold to the first fluid return manifold. The plurality of second fluid passages extend from the second fluid supply manifold to the second fluid return manifold. The plurality of fluid passages extend across an upper surface of the support plate assembly in an alternating manner. The fluid supply conduit is configured to supply a fluid to the fluid supply manifolds.

Full-area counter-flow heat exchange substrate support

The present disclosure generally relates to light field displays and methods of displaying images with light field arrays. In one example, the present disclosure relates to pixel arrangements for use in light field displays. Each pixel includes a plurality of LEDs, such as micro LEDs, positioned adjacent respective micro-lenses of each pixel.

Collimated LED light field display

Embodiments described herein provide for light field displays and methods of forming light field displays where micro-LED arrays are each configured to provide at least a macro-pixel of effective native hardware resolution, where each macro-pixel provides single pixel of spatial resolution and plurality of pixels of angular resolution, and where each pixel of angular resolution includes a plurality of sub-pixels each provided by a directional collimating micro-LED device described herein.

Collimated, directional micro-LED light field display

Described herein are an electrostatic chuck and method for using the same. In one example, an electrostatic chuck is provided that includes a plurality of independently replaceable electrostatic chuck assemblies mounted in an array across a chuck body. The electrostatic chuck assemblies define a substrate support surface suitable for supporting a large area substrate. At least a first electrostatic chuck assembly of the plurality of electrostatic chuck assemblies is operable independent of an operation of a second electrostatic chuck assembly of the plurality of electrostatic chuck assemblies. In yet another example, a method for chucking a substrate is provided.

Bipolar electrostatic chuck and method for using the same

Embodiments disclosed herein generally relate to a slit valve door assembly for sealing an opening in a chamber. A slit valve door that is pressed against the chamber to seal the slit valve opening moves with the chamber as the slit valve opening shrinks so that an o-ring pressed between the slit valve door and the chamber may move with the slit valve door and the chamber. Thus, less rubbing of the o-ring against the chamber may occur. With less rubbing, fewer particles may be generated and the o-ring lifetime may be extended. With a longer lifetime for the o-ring, substrate throughput may be increased.

Slit valve door with moving mating part

Embodiments of the present disclosure generally relate to apparatus and methods for performing photolithography processes. In one embodiment, a system including multiple interferometers for accurately measuring the location of a substrate during operation is provided. The system may include two chucks, and the two chucks are aligned in a first direction. The interferometers are placed along the first direction to measure the location of the substrate with respect to the first direction. The reduced distance between the interferometers and the chuck improves the accuracy of the measurement of the location of the substrate. In another embodiment, mask pattern data is provided to the system, and the mask pattern data is modified based on location and position information of the substrate. By controlling the mask pattern data with the location and position information of the substrate, less positional errors of the pattern formed on the substrate can be achieved.

Apparatus and methods for on-the-fly digital exposure image data modification

Growing community of inventors

Hayward, CA, United States of America

John M White