Intermolecular, Inc.

Kla-tencor Technologies Corporation

Tau Science Corporation

John M Schmidt

Kurt H Weiner

Gregory S Horner

Aaron T Francis

Tony P Chiang

Jianou Shi

Zhiwei Xu

Sergio Edelstein

Amin Samsavar

Thomas G Miller

James Edgar Hudson

Rainer Schierle

Xiaofeng Hu

Leonid A Vasilyev

Mark Alan Arbore

David L Klein

Zachary M Fresco

Kenneth Alfred Williams

Yoshiki Ashizawa

David A Crewe

Patrick Ngatchou

Greg Lim

Gauray Vorma

Heng-Cheng Pal

Kyle Lu

A method of quantum efficiency (QE) photovoltaic measurement is provided that includes coupling measurement electronics to a p-n junction of a Cell Under Test (CUT) that are capable of measuring a pulsed DC photocurrent. The measurement electronics output a response by the CUT to turning on and turning off the pulsed DC photocurrent that are digitized and analyzed for the magnitude that is representative of a conversion efficiency of the CUT to a wavelength of the DC photocurrent, where a measured decay time represents the p-n junction or the minority carrier lifetime. The CUT is exposed to the pulsed DC photocurrent, where signatures of the response to turning off and on to the pulsed DC photocurrent overlap, where a combined amplitude of the response is proportional to an efficiency of a production of photocarriers, where a value of a spectral response at a wavelength is determined.

Methods and systems for characterizing photovoltaic cell and module performance at various stages in the manufacturing process

A vented combinatorial processing cell is described, including a sleeve having an end forming a fluid seal with a region of a substrate, a flow head including a vent and disposed in the sleeve to dispense fluid onto the region, the flow head, the substrate, and the sleeve defining a chamber for processing the region, a fluid source attached to the flow head to deliver the fluid into the chamber, and a vacuum port attached to the flow head to remove fluid from the chamber.

Vented combinatorial processing cell

A reactor assembly having vertically adjustable flow cells is provided. The vertically adjustable flow cells include passageways for distributing a fluid to a reaction region isolated below a bottom surface of corresponding flow cells. The adjustable flow cells enable another dimension of variability for combinatorial processing. Thus, additional data may be gathered for effects on process parameter variations, material variations, process sequence variations, etc., for semiconductor processing operations.

Volume combinatorial processing chamber

A reactor assembly having a plurality of reaction chambers defined therein is provided. The reactor assembly includes conductive leads that mate with contacts disposed on a substrate being combinatorially processed. The conductive leads may be disposed within walls of the reactor assembly so that one end of the lead mates with the contacts on the substrate or anywhere on the surface of a conductive blanket substrate, while the other end of the lead enables communication with an external monitoring or control device.

Combinatorial processing chamber having electrical contacts

An integrated processing tool is described comprising a full-wafer processing module and a combinatorial processing module. Chemicals for use in the combinatorial processing module are fed from a delivery system including a set of first manifolds. An output of each first manifold is coupled to at least one mixing vessel. An output of each mixing vessel feeds more than one of a set of second manifolds. An output of each set of second manifolds feeds one of multiple site-isolated reactors of the combinatorial processing module.

Advanced mixing system for integrated tool having site-isolated reactors

The present invention provides a high-speed Quantum Efficiency (QE) measurement device that includes at least one device under test (DUT), at least one conditioned light source with a less than 50 nm bandwidth, where a portion of the conditioned light source is monitored. Delivery optics are provided to direct the conditioned light to the DUT, a controller drives the conditioned light source in a time dependent operation, and at least one reflectance measurement assembly receives a portion of the conditioned light reflected from the DUT. A time-resolved measurement device includes a current measurement device and/or a voltage measurement device disposed to resolve a current and/or voltage generated in the DUT by each conditioned light source, where a sufficiently programmed computer determines and outputs a QE value for each DUT according to an incident intensity of at least one wavelength of from the conditioned light source and the time-resolved measurement.

High speed quantum efficiency measurement apparatus utilizing solid state lightsource

The current invention provides a shunt defect detection device that includes a device under test (DUT) that is fixedly held by a thermally isolating mount, a power source disposed to provide a directional bias condition to the DUT, a probe disposed to provide a localized power to the DUT from the power source, an emission detector disposed to measure a temporal emission from the DUT when in the directional bias condition, where the measured temporal emission is output as temporal data from the emission detector to a suitably programmed computer that uses the temporal data to determine a heating rate of the DUT and is disposed to estimate an overheat risk level of the DUT, where an output from the computer designates the DUT a pass status, an uncertain status, a fail status or a process to bin status according to the overheat risk level.

High speed detection of shunt defects in photovoltaic and optoelectronic devices

Advanced mixing method for integrated tool having site-isolated reactors

A method to graphically create a recipe for processing a substrate includes displaying graphical images that present processing operations to be performed on the substrate, allowing a user to set properties of the processing operations by manipulating the graphical images, and generating the recipe based on the properties of the processing operations set by the user and synchronizing the plurality of processing operations based on the properties. The graphical images may be time-bars in a Gantt-like chart that allows the user to see the sequence, the timing, and the durations of the processing operations.

Substrate processing recipe manager

Systems configured to perform a non-contact method for determining a property of a specimen are provided. One system configured to perform a non-contact method for determining a property of a specimen includes a focused biasing device configured to provide a stimulus to a focused spot on the specimen. The system also includes a sensor configured to measure a parameter of a measurement spot on the specimen. The measurement spot overlaps the focused spot. The system further includes a processor configured to determine the property of the specimen from the parameter.

Systems configured to perform a non-contact method for determining a property of a specimen

Systems and methods for determining a property of a specimen are provided. The specimen may be a product wafer. The method may include biasing a focused spot on the specimen. The method may also include measuring a parameter of a measurement spot on the specimen. The measurement spot may overlap the focused spot. In addition, the method may include determining the property of the specimen from the measured parameter. Systems and methods for varying the performance of a corona source are also provided. The method may include altering a property of the environment within the corona source. The property may include, but is not limited to, temperature, pressure, humidity, and/or partial pressure of a gas within the corona source.

Contactless charge measurement of product wafers and control of corona generation and deposition

One embodiment disclosed relates to a charged-particle beam apparatus configured with sample charging control. A stage is configured to hold a sample, and a column for generating a charged-particle beam and for directing the beam to an area of the sample. A light beam is generated by an irradiation source and is directed to the area. Bias circuitry is configured to apply a stage bias voltage such that an electric field is created with respect to the sample. Control circuitry is coupled to the irradiation source and to the bias circuitry. The control circuitry is configured to direct the light beam onto the area at a same time as the stage bias voltage is applied to the sample. Other embodiments are also disclosed.

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Oakland, CA, United States of America

John M Schmidt