Svedala Industries, Inc.

John M Paustian

Bobby P Faulkner

A process for removing impurities contained in the crystal lattice of minerals, comprising the steps of forming a mixture of a mineral capable of structurally reorganizing its crystal lattice which contains an impurity in its crystal lattice and a halogen anion, and water; heating the mixture to the mineral's structural reorganization transition temperature; holding the mixture at the structural reorganization transition temperature for a sufficient period of time to allow the impurity to freely migrate from the lattice to combine with the halogen anion; and separating the combined impurity and anion from the mixture to render the mineral essentially free of the impurity. The process is applicable to numerous minerals and impurities, but is especially useful to remove arsenic from fluorspar. Numerous halogen anions can be employed, such as chlorides, fluorides, bromides and iodides, but the preferred halogen anion is a metal chloride such as calcium chloride. Various matrix-forming additives may also be employed with the mixture to provide a receptor which immobilizes the impurity. Preferred additives are silicates, added in the form of bentonite, or other clays as well as organic compounds such as lignosulfonates, starches and starch hydrolyzates.

Method of removing impurities from mineral concentrates

A process for removing impurities contained in the crystal lattice of minerals, comprising the steps of forming a mixture of a mineral capable of structurally reorganizing its crystal lattice which contains an impurity in its crystal lattice and a halogen anion, and water; heating the mixture to the mineral's structural reorganization transition temperature; holding the mixture at the structural reorganization transition temperature for a sufficient period of time to allow the impurity to freely migrate from the lattice to combine with the halogen anion; and separating the combined impurity and anion from the mixture to render the mineral essentially free of the impurity. The process is applicable to numerous minerals and impurities, but is especially useful to remove arsenic from fluorspar. Numerous halogen anions can be employed, such as chlorides, fluorides, bromides and iodides, but the preferred halogen anion is a metal chloride such as calcium chloride. Various matrix-forming additives may also be employed with the mixture to provide a receptor which immobilizes the impurity. Preferred additives are silicates, added in the form of bentonite or other clays.

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Milwaukee, WI, United States of America

John M Paustian