Promos Technologies, Inc

Adeza Biomedical Corporation

Yellowstone Diagnostics Corporation

Lam Research Corporation

Mosel Vitelic Corporation

John Lee

Barbara Haselden

Eric K Gustafson

Rick P Trebino

Yuh-Geng Tsay

Emanuel Calenoff

Eddie Chiu

Yuh-geng Tsay

Chau Arima

Isotropic etching of sacrificial oxide that is adjacent to a trench fill step in an STI wafer can lead to undesired etching away of a sidewall of the trench fill material (e.g., HDP oxide). A sidewall protecting method conformably coats the trench fill step and sacrificial oxide with an etch-resistant carbohydrate. In one embodiment, conforming ARC fluid is spun-on and hardened. A selective, dry plasma etches the hardened ARC over the sacrificial oxide while leaving intact part of the ARC that adheres to the trench fill sidewall. The remnant sidewall material defines a protective shroud which delays the subsequent isotropic etchant (e.g., wet HF solution) from immediately reaching the sidewall of the trench fill material. The delay length of the shroud can be controlled by tuning the etchback recipe. In one embodiment, the percent oxygen in an Oplus Clplasma and/or bias power during the plasma etch is used as a tuning parameter.

Formation of removable shroud by anisotropic plasma etch

A method of forming a double gate structure including sidewalls of substantially similar vertical profile. One photoresist masking step is used to define the top gate, which is then used as a mask to define the bottom gate. The bottom polysilicon layer is etched by a physical and chemical process combination to form a bottom gate with vertical sidewalls substantially inline with the sidewalls of the top gate.

Formation of a double gate structure

A method of etching nitride over oxide is provided for the formation of vertical profile nitride spacers with high uniformity while maintaining the integrity of underlying thin oxide layers. The method includes providing a first gas flow including a first fluorocarbon and a second fluorocarbon at a first ratio, applying a first quantity of power to the first gas flow to create a first plasma, etching a first portion of a silicon nitride layer with the first plasma, providing a second gas flow including the first fluorocarbon and the second fluorocarbon at a second ratio greater than the first ratio, applying a second quantity of power to the second gas flow to create a second plasma, and etching a second portion of the silicon nitride layer with the second plasma.

Two stage etching of silicon nitride to form a nitride spacer

A method for improving profile control during an etch of a nitride layer disposed above a silicon substrate is disclosed. The nitride layer 106 is disposed below a photoresist mask 108A. The method includes positioning the substrate, including the nitride layer and the photoresist mask, in a plasma processing chamber. There is also included flowing a chlorine-containing etchant source gas into the plasma processing chamber. Further, there is included igniting a plasma out of the chlorine-containing etchant source gas to form a chlorine-based plasma within the plasma processing chamber. Additionally, there is included treating, using a chlorine-based plasma, the photoresist mask in the plasma processing chamber. The treatment of the photoresist is configured to etch at least a portion of the photoresist mask and to deposit passivation polymer on vertical sidewalls of the photoresist mask without etching through the nitride layer.

Techniques for etching with a photoresist mask

A reflective biograting consists of an optically flat layer of a transparent composition such as silicon dioxide having a first and second surface, alternating zones of active and inactive binding reagent on the first surface, and a reflective metal layer having a thickness of at least above 1000 .ANG.. The reflective metal layer can be supported on an optically flat surface of a wafer, and the reflective metal can be aluminum, silver, gold, chromium, nickel, titanium or platinum coating on a polished wafer. Preferably, the silicon dioxide layer is formed either by direct sputtering of silicon dioxide or by coating an alkali metal silicate solution on the surface of the reflective metal, optionally containing an aminoalkylsilane and a water-soluble hydroxylated polymer such as a dextran. Alternatively, the reflective support comprises one or more reflective layer units, each reflective layer unit comprising an optically flat layer of silicon, and preferably polysilicon, on a layer of silicon dioxide. Each layer of silicon has a thickness within the range of from 150 to 750 .ANG., from 850 to 1300 .ANG., or from 1700 to 2150 .ANG., and preferably within the range of from 200 to 600 .ANG.. Each layer of silicon dioxide has a thickness within the range of from 800 to 1200 .ANG.. The reflective support is supported on the substantially flat surface of an insoluble support.

Highly reflective biogratings

The assay of the subject invention uses DNA sequences as probes in a nucleic acid hybridization diffraction assay, to detect specific DNA sequences in a sample. Diffraction assay methodologies are applied to determine the presence and amount of analyte. This invention involves a discovery in the areas of supporting surfaces for a biogrid or biograting which provide greatly reduced non-specific hybridization and binding. A preferred process of this invention involves manufacturing a biograting for use in a light diffraction assay, and comprises adhering a uniform layer of hybridizing reagent comprising a nucleotide sequence on a smooth, solid surface and exposing the surface to UV radiation through a shadow mask with a diffraction grating pattern of lines to selectively deactivate the hybridizing reagent, leaving a biological diffraction grating design of lines of active hybridizing reagent. The smooth, solid surface is preferably selected from the group consisting of polysilicon and single crystalline silicon surfaces. The diffraction hybridizing assay method of this invention for determining the presence or quantity of an analyte in an aqueous sample comprises contacting a nucleic acid sequence diffraction biogrid with the sample under proper circumstances and for a sufficient time to permit nucleic acid hybridization between a nucleic acid sequence probe and an analyte; separating the biogrid from the sample; illuminating the biogrid with light from a light source; and determining the light diffracted by the diffraction hybridization assay surface.

DNA probe diffraction assay and reagents

An improved binding assay plate having greatly reduced non-specific binding with proteinaceous reagents comprising a polysilicon surface having a binding reagent adhered thereto, the surface having a coating adsorbed thereon of a proteinaceous non-specific binding inhibitor. This binding assay product is prepared by adhering binding reagent to a polysilicon surface and then treating the surface with the proteinaceous non-specific binding inhibitor. The binding assay method comprises the steps of contacting the polysilicion surface having a primary binding reagent and non-specific binding inhibitor adhered to the surface thereof with a solution containing an analyte with which the primary binding reagent specifically binds for a time sufficient to permit conjugation of analyte with the primary binding reagent and determining the analyte bound to the polysilicon surface. The plate is suitable for both sandwich and competition immunoassays. The reduction of non-specific binding produces a substantial increase in sensitivity.

Polysilicon binding assay support and methods

A diffraction immunoassay method in which a diffraction grating design of non-light disturbing primary binding reagent on an insoluble surface is conjugated with analyte in a sample. If the primary binding reagent-analyte conjugate is light disturbing, a diffraction grating is formed. If the primary binding reagent-analyte conjugate is non-light disturbing, the analyte is further conjugated with a secondary binding reagent which is labeled with a light disturbing material to form a diffraction grating. Light from a narrow band light source is then applied to the surface, and the intensity of beams of diffracted light formed by the diffraction grating is determined. The diffraction immunoassay plate for the method comprises a smooth insoluble surface having on the surface thereof, a diffraction grating design of lines of the primary binding reagent. The diffraction immunoassay apparatus comprises a light source, a platform for supporting the diffraction immunoassay plates in the path of a beam of light from the light source, and at least one light detector positioned to detect light diffracted by the diffraction grating.

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Cupertino, CA, United States of America

John Lee