Lam Research Corporation

Other

John K Shugrue

Son Van Nguyen

Matthias Ilg

Kevin J Uram

Nathan P Sandler

Described are methods and apparatus for a security system. In one embodiment, the system includes capabilities to aid in locating an item that is being monitored when the item's location is unknown. The embodiment also includes capabilities for sounding an alarm when the item is believed to be missing.

Methods and apparatus for a security system

A method for removing glass deposition from a reactor chamber, at least one interior surface of the reactor chamber having the glass deposition deposited thereon. The invention includes introducing a gaseous cleaning mixture comprising an anhydrous hydrogen fluoride (HF) gas into the chamber interior. The invention further includes maintaining the chamber interior at a temperature of between about 0.degree. C. and about 300.degree. C., and removing a gaseous reaction byproduct from the chamber interior.

Anhydrous HF in-situ cleaning process of semiconductor processing

A method of fabricating a semiconductor structure utilizing doped silicate glass on a substrate of a wafer. The method includes the step forming a modulation doped silicate glass structure over a first layer of the wafer. The modulation doped silicate glass structure is formed by depositing at least two alternating layers of heavily-doped silicate glass and lightly-doped silicate glass over the first layer. Both the heavily-doped silicate glass and lightly-doped silicate glass layers may comprise glass doped with both a first dopant and a second dopant. The first dopant may represent, for example, phosphorous, and the second dopant may represent, for example, boron.

Growing community of inventors

Fremont, CA, United States of America

John K Shugrue