Occidental Chemical Corporation

John Hickey

Michael J Fifolt

William S Derwin

Sanjay K Mandal

Kevin R Benson

George Piotrowski

Robert L Bell

James Franc

Disclosed is a method for making high purity .alpha.-chloroxylenes. A composition is formed of about 15 to about 80 wt % of a xylene and about 20 to about 85 wt % of a solvent. The solvent can be toluene, ring halogenated toluene, benzotrichloride, ring halogenated benzotrichloride, benzotrifluoride, ring halogenated benzotrifluoride, .alpha.,.alpha.,.alpha.,.alpha.',.alpha.',.alpha.'-hexafluorometaxylene, .alpha.,.alpha.,.alpha.,.alpha.',.alpha.',.alpha.'-hexafluoroparaxylene, or a mixture thereof. The composition is heated to about 70 to about 160.degree. C. No base is present in the composition. Chlorine gas is sparged through the composition and chlorine free radicals are generated therein. The chlorine free radicals can be generated either with UV light or by means of a chlorine free radical initiator.

Method of making .alpha.-chloroxylenes

Disclosed is a process for making an .alpha.,.alpha.,.alpha.-trifluoromethoxybenzene by reacting an .alpha.,.alpha.,.alpha.-trichloromethoxybenzene or an .alpha.,.alpha.,.alpha.-tribromomethoxybenzene with gaseous hydrogen fluoride in the presence of a catalyst of antimony pentachloride, molybdenum pentachloride, molybdenum dichloride dioxide, molybdenum oxide, or a mixture thereof. The hydrogen fluoride is used in an amount of about 1 to about 1.4 times stoichiometric and is at about atmospheric pressure. The reaction is performed at about 30 to about 100.degree. C.

Method of making trifluoromethoxybenzenes

Disclosed is a method of preparing an aromatic compound having the general formula ##STR1## where R is CF.sub.3, OCF.sub.3, OC.sub.2 F.sub.5, CN, NCO, or COCl, m is 0, 1, or 2, n is 0, 1, or 2, q is 1 or 2, and q+m+n is an integer from 1 to 5. A vapor is prepared of a substrate having the general formula ##STR2## and a chlorinating agent. The mixture is reacted at a temperature above the boiling point of the substrate but below its decomposition temperature. The amount of chlorinating agent is about 0.5 to about 2 times the amount stoichiometrically required to replace the nitro groups on the substrate with chlorine. Unreacted substrate and partially reacted substrate are condensed from the product mixture and are recycled. The substrate is preferably in contact with the chlorinating agent before it is vaporized.

Preparation of nuclear chlorinated aromatic compounds

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John Hickey