E.i. Dupont De Nemours and Company

E. I. Du Pont Nemours and Co.

John H Choi

Neville Everton Drysdale

Harvey Walter Taylor, Jr

Charles D Lang

Alan Lee Shobert

Richard J Kempf

Anchi Hou

Scott D McCalmont

The invention is directed to a process for patterning ceramic tape wherein a photoresist is applied to a ceramic tape, which enables the photoresist, after being exposed patternwise, and developed, to act as a development mask for the tape. The tape then undergoes a development stage, which ultimately removes undesired sections of tape. The tape contains polymeric binder(s) with acidic or alkaline functional pendant groups but not photosensitive ingredients. Therefore, the tape is aqueous processable but itself cannot be photoimaged. However, when this tape is used with conventional photoresists that have the development chemistry opposite from that of the tape, it allows the photoresist to be used as a development barrier layer for the tape.

Process for patterning non-photoimagable ceramic tape

The invention is directed to polymer comprising the repeat unit

Photosensitive ceramic compositions containing polycarbonate polymers

A process for preparing an image on a substrate by applying a photoimageable composition on a first substrate, wherein the photoimageable composition, having a solids content from 25 to 60 weight percent, contains a partially neutralized acid-containing polymer formed from a precursor polymer having an acid number from 90 to 160 prior to neutralization and wherein 1 to 15% of acid-containing groups of the precursor polymer are neutralized with base; an ethylenically unsaturated monomer; a photoinitiator or photoinitiating system, water; 0-5% by weight a solution polymer, based on the weight of total polymer present in the composition; and 0-25% by weight of an organic solvent based on the total weight of the organic solvent and water; wherein the liquid composition is present as a stable emulsion, and wherein the liquid composition has a Brookfield viscosity, at 25.degree. C., from about 10 to about 2000 centipoise; drying the coated photoimageable composition to form a photoimageable layer on a first substrate; imagewise exposing the layer to form imaged and non-imaged areas; and developing the exposed layer having imaged and non-imaged areas to form an image on the first substrate. The exposed layer may be developed by a wash-off development process, peel-apart development process or by application of a toner which may be in the form of a dry toner or a toning film. Print out images may also be obtained.

Process for using photoimageable films prepared for aqueous

A multilayer, photosensitive element comprising a coversheet, a photohardenable layer, a contiguous layer, an isolation layer, an adhesive layer, and a support, is described. The element is used for image reproduction.

Peel-apart photosensitive element

This invention relates to a peel-apart photosensitive element comprising a strippable coversheet, a photorelease layer, a photohardenable layer, an elastomeric layer, and a support, which is useful in a variety of image reproduction processes.

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Sayre, PA, United States of America

John H Choi