Pyramid Technical Consultants Inc.

Applied Materials, Inc.

John Gordon

Raymond Paul Boisseau

William Philip Nett

Andrew Dart

Kan Ota

R Paul Boisseau

Theodore H Smick

Ronald Horner

Keith D Relleen

Robert J Mitchell

Julia C Nett

Paul R Boisseau

An assembly for preventing an overdose of a charged particle beam during therapy to a patient includes a pixelated detector apparatus and a controller. The controller includes, for each pixel: a current integrator circuit that converts the local measured current into a total local detected charge integrated from a start time, the integrator circuit outputting an integrator voltage that corresponds to the total local detected charge; and a discriminator circuit that compares the integrator voltage with a reference voltage, the reference voltage corresponding to a maximum acceptable dose for the patient. A logic circuit generates an overdose fault signal if, at any of the pixels, the integrator voltage is higher than the reference voltage.

Safety dose interlock for charged particle beams

A control system for fine tuning or spreading a charged particle pencil beam includes a low-inductance, low-power compensation or fine-tuning magnet assembly. The feedback loop that includes the compensation magnet assembly has a faster response rate than the feedback loop that includes the scan nozzle. The compensation or fine-tuning magnet assembly is preferably disposed upstream of the scan nozzle magnet(s) with respect to the beam path to make rapid but minor adjustments to the beam position between iterations of the scan nozzle.

Method and apparatus for controlled pencil beam therapy with rapid beam compensation

A control system for providing a closed loop, real time control of a charged particle pencil beam is disclosed. The system includes a first detector apparatus, a second detector apparatus, a first orthogonal magnetic deflector apparatus, a second orthogonal magnetic deflector apparatus, and a controller. The controller compares the measured position and beam angle of the beam with a model position and beam angle of a model beam to determine an offset error and a beam angle error. The first orthogonal magnetic deflector apparatus includes a pair of electromagnets to correct a first component of the offset and beam angle errors. The second orthogonal magnetic deflector apparatus includes a pair of electromagnets to correct a second component of the offset and beam angle errors. The beam can be iteratively adjusted during patient therapy or short pauses in patient therapy.

Method and apparatus for controlled pencil beam therapy

A multi-layer charged particle beam characterization system is disclosed, and method for using the same. A typical embodiment includes a plurality of two-sided metal plates, arranged as a stack, each metal plate having an electrical contact tab extending from at least one common edge of the metal plate, and a plurality of insulator films disposed between adjacent metal plates, each insulator film is sized to match its corresponding metal plate. The tabs are coupled to a printed circuit board and connected to an external electrical connector to register a number of metal plates and insulator layers through which a charged particle beam has penetrated.

Multi-layer range measurement for characterizing charged particle beams

A multi-resolution detector includes a high-resolution pixelated electrode and a low-resolution pixelated electrode. The high-resolution pixelated electrode includes a plurality of sub-arrays of first pixels. Each respective first pixel at each relative position in each sub-array is electrically connected in parallel with one another. The low-resolution pixelated electrode includes a plurality of second pixels. A control system receives as inputs an output from each pixelated detector. The control system uses the inputs to determine a physical position and a transverse intensity distribution of an incident charged particle pencil beam at the resolution of the high-resolution pixelated electrode.

Multi-resolution detectors for measuring and controlling a charged particle pencil beam

A system for calibrating a charged particle pencil beam includes a first pixelated detector, a second pixelated detector, a beam stop, and a diagnostics system. The first and second pixelated detectors measure the pencil beam at positions proximal and/or distal to an isocenter plane. The beam stop is configured to detect an energy level of the pencil beam. The diagnostics system is configured to transmit a signal to request a generation of the charged particle pencil beam at different settings. The diagnostics system is also configured to update a calibration parameter for each setting based on the data received from the pixelated detectors and the beam stop.

Method and apparatus for calibrating a charged particle pencil beam used for therapeutic purposes

A variety of systems, apparatus and methods for deflecting a particle beam are described. An apparatus comprises at least six electromagnetic portions disposed on a plane. Each of the at least six electromagnetic portions is aligned with a radius emanating from an axis normal to the plane and is distanced from the axis to form a volume about the axis. At least six coils are configured for affecting a dipole magnetic field in the volume in response to electrical currents applied to physically opposing coils where a particle beam entering the volume is deflected. Each of the at least six coils is disposed about a one of the at least six electromagnetic portions. A yoke structure is configured for returning a generated magnetic flux.

System, apparatus and method for deflecting a particle beam

An ion implanter incorporates an r.f. accelerator assembly to provide ions for implant at high energies. The accelerator assembly includes electrodes mounted in the vacuum chamber so as to be movable between an operational position for generating and accelerating electric field and a non operational position within the vacuum chamber displaced clear of the beam path. An Actuator moves the electrode between the operational and non operation positions. For energy implanting, the electrodes are in the operational position and for low energy implants the actuator moves the electrodes to the non operational position clear of the beam path.

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Henfield, United Kingdom

John Gordon