International Business Machines Corporation

Axcelis Technologies, Inc.

John Francis Grant

Patrick Richard Splinter

Brian S Freer

Joseph L Malenfant, Jr

Jiong Chen

Lawrence T Jacobs

An ion implantation system comprising an ion source configured to generate an ion beam along a beam path, a mass analyzer is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.

System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes

The present invention provides a method of extending, i.e. prolonging, the operating lifetime of hot cathode discharge ion source by utilizing and introducing a nitrogen-containing co-bleed gas into an ion implantation apparatus which contains at least a hot cathode discharge ion source and an ion implantation gas such as GeF,.

Method to operate GEF4 gas in hot cathode discharge ion sources

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Beverly, MA, United States of America

John Francis Grant