Silicon Laboratories Inc.

Silicon Labs Cp, Inc.

John Ellis

A capacitive touch slider array comprises a first conductive trace associated with a first sensing node. The first conductive trace includes a first conductive line and a plurality of first conductive fingers extending from the first conductive line. The plurality of first conductive fingers have lengths that increase from a first end of the capacitive touch slider array to a second end of the capacitive touch slider array. A second conductive trace associated with a second sensing node includes a second conductive line and a plurality of second conductive fingers extending from the second conductive line. The plurality of second conductive fingers have lengths that increase from the second end of the capacitive touch slider array to the first end of the capacitive touch slider array.

Method and apparatus for implementing a capacitive touch slider

Marking system for a semiconductor wafer to identify problems in mask layers. A method for forming a mask which includes the step of first creating at least one drawing layer that defines changes to the structures to be formed on the surface of a semiconductor substrate at one step in the processing thereof, which step involves the use of a mask. The at least one drawing layer will define a pattern region that will either result in removal of the material from the semiconductor substrate in the defined pattern region, or removal of matter from the semiconductor substrate around the defined pattern region. An indicator area is created in the at least one drawing layer, the indicator area having an indicator region disposed therein that will result in removal of material from around the indicator region regardless of whether the mask is a dark tone mask or a clear tone mask, the indicator region appearing in the negative if the mask is a dark tone mask. A mask is then created from the at least one drawing layer as either a dark tone mask having a transparent region corresponding to the defined pattern region for exposing the underlying substrate if the defined pattern region is associated with a process that results in material being removed from around the defined pattern region, or as a clear tone mask having an occluding region corresponding to the defined pattern region if the defined pattern region is associated with a process that results in material being removed from the defined pattern region.

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Austin, TX, United States of America

John Ellis