Burroughs, Inc.

John Edmond Wolfe

Lynwood W Swanson

Disclosed is an electron-beam system comprised of an iris having an aperture of predetermined shape; a cathode for emitting electrons from an area which is substantially smaller than the aperture; a lens system for directing the emitted electrons along a path through the aperture to form a magnified image of the aperture; and a target for the electrons which is placed along the path of the aperture's demagnified shadow.

Shadow casting electron-beam system

Disclosed is an electron-beam cathode which emits electrons in a cone-shaped pattern whose electron density is substantially uniform throughout the cone. The cathode is comprised of a needle-shaped piece of single crystal tungsten having dopant atoms of zirconium and oxygen in the bulk thereof, and having only a single (100) surface on the needle's tip. This cathode is formed by the steps providing a needle-shaped piece of single crystal tungsten having dopant atoms of zirconium and oxygen in the bulk thereof, and having a plurality of ring-shaped (100) surfaces on the needle's tip; and subsequently transforming those surfaces into diagonally oriented planar surfaces by heating the needle in an atmosphere of oxygen to diffuse tungsten atoms from the needle's tip to its sides.

Electron-beam cathode having a uniform emission pattern

Disclosed is an electron-beam cathode which emits electrons with a low work function over a relatively wide range of temperature and pressure. The cathode is comprised of single crystal tungsten having zirconium and oxygen dopant atoms within the bulk thereof. This cathode is formed by the steps of attaching zirconium to a portion of the surface of single crystal tungsten, and heating the tungsten with the zirconium attached thereto in an atmosphere of oxygen to diffuse the zirconium and the oxygen into the bulk of the tungsten.

Low work function cathode

This disclosure relates to an electron beam generator having a high brightness electron beam source and a focusing lens placed between the source and the target area to provide a large image focal distance relative to the object focal distance. In addition, two sets of deflection coils or plates are placed between the focusing means and the target where the first deflection means provides that deflection required for generation of the desired pattern and the second deflection means between the first deflection means and the target then deflects the beam back to a path normal to the target surface.

Double deflection electron beam generator for employment in the

A method of making a pattern for a photolithographic mask. A field ion source is advantageously utilized to produce heavy ions with a high beam current density. The ions are accelerated and directly bombard a metallic coating on the mask substrate to form openings therein in the desired pattern.

Focused ion beam mask maker

This disclosure relates to an electron beam generator and focusing mechanism including a high current thermionic field emission source to establish a high current electron beam and an electro-magnetic focusing means placed along the axis of the electron beam between the source and the target so as to provide a large image focal distance with the electron beam source being formed of a tungsten cathode which is coated with zirconium.

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Escondido, CA, United States of America

John Edmond Wolfe