General Electric Company

John Douglas Evans, Sr

Robert William Bruce

Antonio Frank Maricocchi

David John Wortman

David Vincent Rigney

Rudolfo Viguie

William Seth Willen

Robert George Zimmerman, Jr

Keith Humphries Betscher

Christopher Lee Lagemann

Joseph David Rigney

John Frederick Ackerman

William Randolph Stowell

Roger Dale Wustman

Jeffrey Allen Conner

Mark Alan Rosenzweig

Theodore Robert Grossman

William Clarke Brooks

Brian Harvey Pilsner

Brent Ross Tholke

Karl S Fessenden

Karl Stephen Fessenden

An apparatus for providing a vacuum coating to a workpiece, including: a coating chamber containing a coating material, with the coating chamber being operable at an elevated temperature and a sub-atmospheric pressure; an electron beam gun projecting an electron beam into the coating chamber and onto the coating material, where the electron beam gun is operable to melt the coating material and to evaporate molten coating material; and, a mechanism for supporting manipulating the workpiece in the coating chamber. The supporting mechanism further includes: a coupling device for retaining the workpiece; a joint connected to the coupling device enabling movement of the workpiece in all directions; an intermediate member connecting the coupling device and the joint; and, a device connected to the intermediate member for moving the workpiece in a designated vertical plane. The supporting mechanism may also include a device connected to the intermediate member for moving the workpiece in a designated horizontal plane.

Vacuum coater device and mechanism for supporting and manipulating workpieces in same

Apparatus for electroplating a workpiece includes an unassembled electroplating anode assembly having weldable first and second structural anode members. The first structural anode member includes a positioning slot. The second structural anode member includes a positioning tab disposable in the positioning slot. A method for making an electroplating anode assembly includes obtaining an electroplating-anode-assembly first structural anode member having a positioning slot and obtaining an electroplating-anode-assembly second structural anode member having a positioning tab. The method also includes locating the positioning tab in the positioning slot and welding together the first and second structural anode members.

Electroplating apparatus and method for making an electroplating anode assembly

An electron beam physical vapor deposition (EBPVD) process performed with a coating apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber operated at an elevated temperature and a subatmospheric pressure. The coating chamber contains a crucible and a coating material surrounded by and contained within the crucible, and the coating material has a surface exposed by the crucible. The process entails projecting an electron beam onto the surface of the coating material, wherein the electron beam defines a beam pattern having a higher intensity at an interface of the surface of the coating material with the crucible than at a central region of the surface of the coating material.

Electron beam physical vapor deposition process

An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the shape and intensity of the electron beam pattern on the coating material and on a crucible containing the molten coating material.

Electron beam physical vapor deposition apparatus

An electron beam physical vapor deposition (EBPVD) apparatus for producing a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber through an aperture in a wall of the chamber and onto a coating material within a coating region defined within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion within the coating chamber of a second chamber that encloses the aperture so as to separate the aperture from the coating region. The second chamber is maintained at a pressure lower than the coating region.

An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus at coating pressures above 0.010 mbar.

Method of operating an electron beam physical vapor deposition apparatus

An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion of a crucible that supports the coating material and is configured to be efficiently cooled so as to reduce the rate at which the process temperature increases within the coating chamber.

Electron beam physical vapor deposition apparatus and crucible therefor

A method of removing a ceramic coating ( ), and particularly zirconia-containing thermal barrier coating (TBC) materials such as yttria-stabilized zirconia (YSZ), that has been either intentionally or unintentionally deposited on the surface of a component ( ). The method entails subjecting the ceramic coating ( ) to an aqueous solution containing an acid fluoride salt, such as ammonium bifluoride (NH HF ) or sodium bifluoride (NaHF ), and a corrosion inhibitor. The method is capable of completely removing the ceramic coating ( ) without removing or damaging the underlying substrate material, which may include a metallic bond coat ( ).

Method of removing ceramic coatings

A method of depositing a ceramic thermal barrier coating on an article that will be subjected to a hostile environment, such as turbine, combustor and augmentor components of a gas turbine engine. The thermal barrier coating is deposited by electron beam physical vapor deposition (EBPVD) using process parameters that include an absolute pressure of greater than 0.010 mbar and an oxygen partial pressure of greater than 50%, preferably at or close to 100%. Under these conditions, the desired ceramic material is evaporated with an electron beam to produce a vapor that deposits on the component to form a thermal barrier coating of the ceramic material.

Method for forming a thermal barrier coating by electron beam physical vapor deposition

A component for use in a high-temperature environment such as the coating chamber of a PVD apparatus. A reflective coating on the component serves as a barrier to radiant heat transfer to the component by reflecting thermal radiation. The coating comprises at least one pair of reflective layers, each layer being formed of a material that is essentially transparent to electromagnetic wavelengths of between 500 and 3000 nanometers (nm). In addition, the material of the outermost layer of the pair has a higher index of refraction than the material of the other layer of the pair.

Coating for reducing operating temperatures of chamber components of a coating apparatus

An apparatus for depositing a ceramic coating by electron beam physical vapor deposition (EBPVD). Ceramic coatings of more uniform thickness over a larger surface area are deposited by increasing the size of a pool of molten ceramic from which the ceramic is deposited. The apparatus uses a crucible that surrounds a ceramic material that serves as the source of the deposited ceramic coating. The crucible is configured to define a reservoir whose cross-sectional area is larger than the cross-sectional area of the ceramic material. The size of the pool is increased by increasing the size of the reservoir in lieu of increasing the diameter of the ceramic material in order to maintain acceptable ingot quality.

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Springfield, OH, United States of America

John Douglas Evans, Sr