Micron Technology Incorporated

Intel Corporation

Other

Lodestar Licensing Group LLC

John David Hopkins

Jordan D Greenlee

Alyssa N Scarbrough

Nancy M Lomeli

Gordon A Haller

Hongbin Zhu

Fatma Arzum Simsek-Ege

Rita J Klein

Justin B Dorhout

Roger W Lindsay

Kunal Shrotri

Collin Howder

Damir Fazil

David A Daycock

Jie Sun

Zhenyu Lu

Yushi Hu

Purnima Narayanan

Darwin A Clampitt

Lifang Xu

Akira Goda

Luan C Tran

Everett Allen McTeer

Shuangqiang Luo

Christopher J Larsen

Vinayak Shamanna

Shyam Surthi

Richard J Hill

Anish A Khandekar

Fei Wang

Daniel Billingsley

Charles H Dennison

Yongjun Jeff Hu

Indra V Chary

Matthew J King

Darwin Franseda Fan

Tom Jibu John

Srikant Jayanti

Chet E Carter

M Jared Barclay

Jiewei Chen

John Mark Meldrim

Changhan Kim

Kunal R Parekh

Krishna Kumar Parat

Martin Ceredig Roberts

Swapnil Lengade

Aaron R Wilson

Qian Tao

Matthew Park

Randy J Koval

Jivaan Kishore Jhothiraman

Yiping Wang

Ryan L Meyer

Ian C Laboriante

Justin D Shepherdson

Merri Lyn Carlson

Rohit Kothari

Meng-Wei Kuo

Kar Wui Thong

Paolo Tessariol

Xiao Li

Adam L Olson

Brett D Lowe

Harsh Narendrakumar Jain

Andrew Li

Dimitrios Pavlopoulos

Brian J Cleereman

James Mathew

Aurelio Giancarlo Mauri

Prasanna Srinivasan

Jeslin J Wu

David H Wells

Ronald Allen Weimer

Anilkumar Chandolu

Christopher W Petz

Sanjeev Sapra

Alex J Schrinsky

Shawn D Lyonsmith

Luca Fumagalli

Haoyu Li

Marko Milojevic

Chris Larsen

Jun Fang

John A Smythe

George Matamis

Allen McTeer

Adam William Saxler

Zahra Hosseinimakarem

Silvia Borsari

David Ross Economy

Erik R Byers

Yi Hu

Peng Xu

Xiaosong Zhang

Jie Li

Grady S Waldo

Francois H Fabreguette

Ramey M Abdelrahaman

Shen Hu

Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes tiers located one over another, the tiers including respective memory cells and control gates for the memory cells; a first pillar extending through the tiers and separated from the control gates, the first pillar including a first dielectric liner portion and a first core portion adjacent the first dielectric liner portion, the first dielectric liner portion and the first core portion extending along a length of the first pillar; and a second pillar extending through the tiers and separated from the control gates, the second pillar including a second dielectric liner portion and a second core portion adjacent the second dielectric liner portion, the second dielectric portion and the second core portion extending along a length of the second pillar, wherein the first core portion and the second core portion have different materials.

Memory device including support structures and contact structures having different materials

Methods, systems, and devices for self-aligned etching techniques for memory formation are described. A memory device may include a stack of alternating materials and a pillar extending through the stack of alternating materials, where the stack of alternating materials and the pillar may form a set of multiple memory cells. A polysilicon material may be formed above the pillar, where the polysilicon material may be associated with a selector device for the memory cells. A masking material may be formed above the polysilicon material and the stack of alternating materials, where the masking material may be aligned with the polysilicon material and may have a width that is greater than a width of the polysilicon material and the pillar. The masking material may prevent the polysilicon material, the pillar, and a portion of the stack of alternating materials beneath the masking material from being removed during an etching operation.

Self-aligned memory architecture comprising a memory array associated with pillars and polysilicon material

Some embodiments include an integrated assembly having a first deck which has first memory cells, and having a second deck which has second memory cells. The first memory cells have first control gate regions which include a first conductive material vertically between horizontally-extending bars of a second conductive material. The second memory cells have second control gate regions which include a fourth conductive material along an outer surface of a third conductive material. A pillar passes through the first and second decks. The pillar includes a dielectric-barrier material laterally surrounding a channel material. The first and fourth materials are directly against the dielectric-barrier material. Some embodiments include methods of forming integrated assemblies.

Integrated assemblies which include stacked memory decks, and methods of forming integrated assemblies

Integrated circuitry comprising a memory array comprises strings of memory cells comprising laterally-spaced memory blocks that individually comprise a first vertical stack comprising alternating insulative tiers and conductive tiers. Strings of memory cells comprise channel-material strings that extend through the insulative tiers and the conductive tiers. The conductive tiers individually comprise a horizontally-elongated conductive line. A second vertical stack is aside the first vertical stack. The second vertical stack comprises an upper portion and a lower portion. The upper portion comprises alternating first insulating tiers and second insulating tiers. The lower portion comprises a lowest insulator tier directly above conductor material of a conductor tier. The lowest insulator tier comprises solid carbon and nitrogen-containing material. An immediately-adjacent tier is directly above the solid carbon and nitrogen-containing material of the lowest insulator tier. The immediately-adjacent tier comprises material that is of different composition from that of the lowest insulator tier. Other embodiments, including methods, are disclosed.

Integrated circuitry and method used in forming a memory array comprising strings of memory cells

Methods, systems, and devices for a barrier structure for preventing removal of, such as etching to, control circuitry are described. A memory device may include control circuitry over a substrate and for accessing a memory array and contact regions configured to couple with the control circuitry. The memory device may include barrier regions between respective contact regions that includes a barrier material. The memory device may include a stack of layers over the barrier region and the contact regions that is associated with the memory array, and the barrier material may prevent a removal (e.g., an etch) through the stack of layers and at least partially between contact regions from extending to the control circuitry.

Barrier structure for preventing etching to control circuitry

A method used in forming a memory array comprising strings of memory cells comprises forming an upper stack directly above a lower stack. The lower stack comprises vertically-alternating lower-first-tiers and lower-second-tiers. The upper stack comprises vertically-alternating upper-first-tiers and upper-second-tiers. Lower channel openings extend through the lower-first-tiers and the lower-second-tiers. The lower channel openings have sacrificial material therein. An upper of the lower-second-tiers or a lower of the upper-second-tiers comprises non-stoichiometric silicon dioxide that has a silicon-to-oxygen atomic ratio greater than 0.5. A higher of the upper-second-tiers that is above said lower upper-second-tier comprises silicon dioxide that has a silicon-to-oxygen atomic ratio less than or equal to 0.5. Upper channel openings are etched through the upper-first-tiers and the upper-second-tiers to stop on said upper lower-second-tier or said lower upper-second-tier. After the stop, the sacrificial material is removed from the lower channel openings and channel-material strings are formed in the upper and lower channel openings. Other embodiments, including structure independent of method, are disclosed.

Integrated circuitry comprising a memory array comprising strings of memory cells and methods used in forming a memory array comprising strings of memory cells

A memory array comprising strings of memory cells comprises a conductor tier comprising conductor material. Laterally-spaced memory blocks individually comprise a vertical stack comprising alternating insulative tiers and conductive tiers. Channel-material strings of memory cells extend through the insulative tiers and the conductive tiers. Conducting material of a lower of the conductive tiers directly electrically coupling together the channel material of individual of the channel-material strings and the conductor material of the conductor tier. The conducting material in the lower conductive tier comprises upper conductively-doped semiconductive material, lower conductively-doped semiconductive material, and intermediate material vertically there-between. The intermediate material is of different composition from those of the upper conductively-doped semiconductive material and the lower conductively-doped semiconductive material and comprises at least one of carbon, nitrogen, oxygen, metal, and n-type doped material also comprising boron. Other embodiments, including method, re disclosed.

Memory arrays comprising strings of memory cells and methods used in forming a memory array comprising strings of memory cells

A memory array comprising strings of memory cells comprises laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers above a conductor tier. Strings of memory cells comprise channel-material-string constructions that extend through the insulative tiers and the conductive tiers into the conductor tier. The channel material of the channel-material-string constructions directly electrically couples to conductor material of the conductor tier. The conductor tier comprises islands comprising material of different composition from that of the conductor material of the conductor tier that surrounds individual of the islands. The islands are directly against bottoms of the channel-material-string constructions. Intervening material is laterally-between and longitudinally-along immediately-laterally-adjacent of the memory blocks. Other aspects, including method, are disclosed.

Memory arrays comprising strings of memory cells with conductive islands

Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes a first dielectric material; a second dielectric material separated from the first dielectric material; a memory cell string including a pillar extending through the first and second dielectric materials, the pillar including a portion between the first and second dielectric materials; and a tungsten material located between the first and second dielectric materials and separated from the portion of the pillar and the first and second dielectric materials by an additional dielectric material. The additional dielectric material has a dielectric constant greater than a dielectric constant of silicon dioxide. The additional dielectric material contacts the portion of the pillar and the tungsten material.

Memory device including control gates having tungsten structure

A liner is formed laterally-outside of individual channel-material strings in one of first tiers and in one of second tiers. The liners are isotropically etched to form void-spaces in the one second tier above the one first tier. Individual of the void-spaces are laterally-between the individual channel-material strings and the second-tier material in the one second tier. Conductively-doped semiconductive material is formed against sidewalls of the channel material of the channel-material strings in the one first tier and that extends upwardly into the void-spaces in the one second tier. The conductively-doped semiconductive material is heated to diffuse conductivity-increasing dopants therein from the void-spaces laterally into the channel material laterally there-adjacent and upwardly into the channel material that is above the void-spaces.

Method used in forming a memory array comprising strings of memory cells using pillars

A microelectronic device includes a stack structure, slot structures, and dielectric material. The stack structure includes blocks each including a vertically alternating sequence of conductive material and insulative material arranged in tiers. At least one of the blocks includes an array region including strings of memory cells, and a staircase region including a crest sub-region interposed between a staircase structure and the array region. An uppermost boundary of the tiers within the crest sub-region underlies an uppermost boundary of the tiers within the array region. The slot structures are interposed between the blocks of the stack structure. The dielectric material extends over and between the blocks of the stack structure. A thickness of a portion of the dielectric material overlying the crest sub-region is greater than a thickness of an additional portion of the dielectric material overlying the array region. Related memory devices, electronic systems, and methods are also described.

Methods of forming microelectronic devices, and related microelectronic devices, memory devices, and electronic systems

An electronic device comprises a stack comprising tiers of alternating conductive levels and insulative levels overlying a source, slots extending vertically through the stack and dividing the stack into blocks, and support pillars within the slots and extending vertically through the stack. The support pillars exhibit a lateral dimension in a first horizontal direction relatively larger than a lateral dimension of the slots in the first horizontal direction, substantially orthogonal to a second horizontal direction in which the slots extend. Related memory devices, systems, and methods are also described.

Electronic devices including support pillars in slot regions, and related memory devices, systems, and methods

A memory array comprising strings of memory cells comprises laterally-spaced memory-blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers directly above conductor material of a conductor tier. Channel-material-string constructions extend through the insulative and conductive tiers to a lowest of the conductive tiers. The channel-material-string constructions individually comprise a charge-blocking-material string, a storage-material string laterally-inward of the charge-blocking-material string, a charge-passage-material string laterally-inward of the storage-material string, and a channel-material string laterally-inward of the charge-passage-material string. A lowest surface of the charge-blocking-material string that is above a lowest surface of the lowest conductive tier is below a lowest surface of a lowest of the insulative tiers that is immediately-above the lowest conductive tier. Conductive material in the lowest conductive tier directly electrically couples together the channel material of individual of the channel-material strings and the conductor material of the conductor tier. Structure independent of method is disclosed.

A microelectronic device includes a first conductive structure, a barrier structure, a conductive liner structure, and a second conductive structure. The first conductive structure is within a first filled opening in a first dielectric structure. The barrier structure is within the first filled opening in the first dielectric structure and vertically overlies the first conductive structure. The conductive liner structure is on the barrier structure and is within a second filled opening in a second dielectric structure vertically overlying the first dielectric structure. The second conductive structure vertically overlies and is horizontally surrounded by the conductive liner structure within the second filled opening in the second dielectric structure. Memory devices, electronic systems, and methods of forming microelectronic devices are also described.

Microelectronic devices, memory devices, and electronic systems

A method used in forming memory circuitry comprises forming a stack comprising vertically-alternating first tiers and second tiers. The stack extends from a memory-array region into a stair-step region. The stair-step region comprises a flight of stairs extending along a first direction. The first tiers are conductive and the second tiers are insulative at least in a finished-circuitry construction. An anisotropically-etched spacer is formed extending along the first direction directly above the flight of stairs. The anisotropically-etched spacer is used as a mask while etching through one of the first tiers and one of the second tiers in individual of the stairs to form multiple different-depth treads in the individual stairs along a second direction that is orthogonal to the first direction. Individual of the treads comprise conducting material of individual of the first tiers in the finished-circuitry construction. Other aspects, including structure independent of method, are disclosed.

Memory circuitry and method used in forming memory circuitry

Growing community of inventors

Meridian, ID, United States of America

John David Hopkins