General Electric Company

Momentive Performance Materials Gmbh

John D Neely

Steven William Webb

Alan Ritzer

Kenrick M Lewis

John S Razzano

Abellard T Mereigh

Yanjun Zhu

The present invention is directed to a process for the synthesis of organohalosilane monomers, comprising the steps of (1) forming a slurry of cyclone fines, ultra fines and/or spent contact mass in a thermally stable solvent and reacting the agitated slurry with an organohalide of the formula RX in the presence of an additive for a time and at a temperature sufficient to produce organohalosilane monomers having the formulae RSiHX, RSiHX, RSiX, RSiX, and RSiX; wherein Ris a saturated or unsaturated aromatic group, a saturated or unsaturated aliphatic group, alkaryl group, or cycloaliphatic hydrocarbyl group, and X is a halogen; and (2) recovering said organohalosilane monomers.

Slurry phase direct synthesis of organohalosilanes from cyclone fines

Discloses herein is a catalytic process for producing organohalosilane monomers from a high-boiling residue resulting from the Direct Reaction of an organohalide with silicon. The high-boiling residue contains more conventionally cleavable compounds than conventionally uncleavable compounds. The process includes heating the residue in the presence of a catalyst comprising (1) one or more heterocyclic amines and/or one or more heterocyclic ammonium halides, and (2) one or more quaternary Group 15 onium compounds.

Synthesis of organohalosilane monomers via enhanced cleavage of direct process residue

Disclosed herein is a catalytic process for the synthesis of organohalosilane monomers from tetraorganodihalodisilanes and other compounds that are not cleaved during the conventional hydrochlorination of Direct Process Residue. The process is characterized by the use of a catalyst containing (1) one or more heterocyclic amines and/or one or more heterocyclic ammonium halides, and (2) one or more quaternary Group 15 onium compounds.

Synthesis of organohalosilane monomers from conventionally uncleavable Direct Process Residue

A method is provided for passivating spent silicon contact mass by heating the spent silicon contact mass at a temperature in the range of from 200.degree. C. to 800.degree. C. in an oxygen containing atmosphere.

Process for stabilizing spent silicon contact mass

A method is provided for passivating spent silicon contact mass by treating the spent silicon contact mass at a temperature in range of from 900.degree. C. to 1500.degree. C. in an inert atmosphere.

A method for making organohalosilanes is provided utilizing spent contact mass generated during the production of organohalosilanes by the direct method which has been treated in an oxygen containing atmosphere to render it non-pyrophoric in air.

Method for making organohalosilanes

A method for making organohalosilanes is provided utilizing a spent contact mass generated during the production of organohalosilanes by the direct method which has been thermally treated to render it non-reactive in air.

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Clifton Park, NY, United States of America

John D Neely