Verity Instruments, Inc.

John D Corless

Mark Anthony Meloni

Mike Whelan

Andrew Weeks Kueny

Larry Arlos Bullock

Chris D Pylant

Kenneth C Harvey

Richard J Daignault, Jr

Sean Lynes

Timothy C Michals

Rick Daignault

The disclosure provides features for improved processing of optical data by identifying and characterizing stationary and transient signals in the electrical data representing the data collected from an optical sensor of an optical measurement system. In one example, an optical measurement system is disclosed that includes: (1) a pixel area of an optical sensor having multiple pixels that store an electrical charge corresponding to a received optical signal, (2) one or more reduced illumination regions that provide signal levels intrinsic to the optical sensor, and (3) one or more processors configured to adjust, during active operation of the system, digital representations of the electrical charges from the pixels of the pixel area using characterizations of the signal levels from the one or more reduced illumination regions.

System, apparatus, and method for improved background correction and calibration of optical devices

The disclosure provides improved processing of optical data by identifying anomalous signals in the electrical data representing the optical data. The improved processing can also include modifying the identified anomalous signal data to provide a truer representation of the optical data. The disclosed processing can be used by various systems and apparatuses for processing spectral data corresponding to the optical data. The improved processing can be used to improve the monitoring of semiconductor processes and, therefore, improve the overall semiconductor processes. In one example, a method of processing spectral data includes: (1) receiving temporally separated spectral data samples, and (2) identifying one or more anomalous signals in an intermediate one of the temporally separated spectral data samples based on at least one preceding and at least one subsequent ones of the spectral data samples.

System, apparatus, and method for spectral filtering

The disclosure provides multimode configurable spectrometers, a method of operating a multimode configurable spectrometer, and an optical monitoring system. In one embodiment the multimode configurable spectrometer includes: (1) an optical sensor configured to receive an optical input and convert the optical input to electrical signals, wherein the optical sensor includes multiple active pixel regions for converting the optical input to the electrical signals, and (2) conversion circuitry, having multiple selectable converting circuits, that is configured to receive and convert the electrical signals to a digital output according to a selected one of the selectable converting circuits.

Multimode configurable spectrometer

An optical system having an OAP mirror collimator is disclosed with a housing, an OAP mirror located within the housing and has an optical axis, a fold plane and a focal point. A fiber optical cable is coupled to the housing and has first and second optical fibers, each having an exit end that form a common end face of the fiber optic cable, wherein the fiber optical cable is rotationally and translationally aligned to the OAP mirror such that the common face is perpendicular to and centered upon the optical axis of the OAP mirror and positioned a fixed distance from the focal point, and wherein the optical axes of the first and second optical fibers are jointly angularly aligned to the fold plane, and the optical axes of the first and second optical fibers deviate from being parallel to the optical axis by no more than 0.15 degrees.

Fiberoptically-coupled measurement system with reduced sensitivity to angularly-driven variation of signals upon reflection from a wafer

The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.

System and method for calibration of optical signals in semiconductor process systems

A digital flashlamp controller, a flashlamp control system and a method of controlling a flashlamp bulb employing digital control electronics are provided herein. In one embodiment, the digital flashlamp controller includes: (1) a trigger interface configured to provide firing signals to control a trigger element for a flashlamp bulb and (2) digital electronics configured to generate the firing signals and control multiple pulsing of the flashlamp bulb.

High dynamic range measurement system for process monitoring

A referenced and stabilized optical measurement system includes a light source, a plurality of optical elements and optical fiber assemblies and a detector arranged to compensate for the effects of system variation which may affect measurement performance. A non-continuous light source provides a common source light on a common source path. A reference light and a measurement light are derived from the common source light and propagated across separate paths of optically matching optical components in order to produce a common signal variation on both the reference light signal and the measurement light signal. Light paths exposed to air are contained indiscrete volumes for purging gasses from the volumes. Ratios of the reference signal and measurement signal are acquired under various conditions for compensating the measurement signal for system variations.

Referenced and stabilized optical measurement system

A workpiece characterization system for obtaining simultaneous measurement of layer and photoluminescence properties of a workpiece. The workpiece characterization system includes an excitation light and an illumination light each impinging upon a surface of a workpiece whereby the workpiece emits photoluminescent light and encodes light from said illumination source with layer information. The excitation light and the illumination light are generated from a single light source. The light from the single light source is filtered to remove wavelengths of light that correlate to light wavelengths emitted from the workpiece as a result of excitation. Wavelengths that correlate to light reflected from the workpiece that may contain encoded information are not filtered.

Workpiece characterization system

A flashlamp control system is provided with a capacitor that is statically electrically connected to the high voltage power supply, and a current sensing component is then electrically connected to the static capacitor and digital control electronics to monitor the charge current and/or the discharge current to static capacitor. A dynamically switchable capacitor electrically may also be connected to the high voltage power supply and digital control electronics for isolating the dynamically switchable capacitor from the high voltage power supply based on the monitored charge current and/or discharge current. One or more homogenizing element, comprise of an air gap, diffusing homogenizing element, imaging element, non-imaging element or light pipe homogenizing element, may be disposed in the light path proximate to the flashlamp, such as a multichannel distributor if present, to decrease the coefficient of variation of the optical signal, either temporally and spectrally, or both.

The present invention is directed to a system and method for radiometric calibration of spectroscopy equipment utilized in fault detection and process monitoring. Initially, a reference spectrograph is calibrated to a local primary standard (a calibrated light source with known spectral intensities and traceable to a reference standard). Other spectrographs are then calibrated from the reference spectrograph rather than the local primary calibration standard. This is accomplished by viewing a light source with both the reference spectrograph and the spectrograph to be calibrated. The output from the spectrograph to be calibrated is compared to the output of the reference spectrograph and then adjusted to match that output. The present calibration process can be performed in two stages, the first with the spectrographs calibrated to the reference spectrograph and then are fine tuned to a narrow band light source at the plasma chamber. Alternatively, the reference spectrograph can be calibrated to the local primary standard while optically coupled to the plasma chamber. There, the local primary standard calibration light source is temporarily positioned within the plasma chamber, or in a light chamber disposed along the interior of the chamber for calibrating the reference spectrograph. Other spectrographs can be calibrated to the reference spectrograph while coupled to the plasma chamber with the local primary standard calibration light source, thereby calibrating every component in the entire optical path to the reference spectrograph.

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Carrollton, TX, United States of America

John D Corless