Other

Eastman Chemical Company

General Chemical Performance Products, LLC

H.c. Starck Gmbh

Brewer Science, Inc.

Pbi Performance Products, Inc.

Daetec. LLC

General Chemical Corporation

Merck Patent Gmbh

Moore, John Cleaon

John Cleaon Moore

Jared Michael Pettit

Michael Wayne Quillen

Edward Enns McEntire

Dale Edward O'Dell

Zachary Philip Lee

Alman XiMin Law

Patrick Hogan

Gregory S Copeland

Michael Gruender

Alex Brewer

Richard Dalton Peters

Spencer Erich Hochstetler

Rodney Scott Armentrout

Michelle Fowler

Darryl W Muck

Alexander Joseph Brewer

Xing-Fu Zhong

Richard Tsai

L Palmer Holbrook

Frank Chiu

Alexander C Smith

James R Esposito

Compositions and designs are described for a sectional porous carrier used in processing microelectronics where thin device substrates are affixed by adhesive to the carrier and form an impervious bonded stack that is resistant to thermal and chemical products during processing and is easily handled by a substrate handling vacuum robot, and subsequently allows rapid removal (debonding) in batch operations by directional penetration into sectional porous regions by selective liquids which release the carrier from the device wafer without harm. The invention carrier with porous regions is used for temporary support of thin and fragile device substrates having capabilities of selective penetration of chemical liquids to pass through the porous regions, access and breakdown the bonding adhesive, and allow it to release without damage to the device substrate. The sectional porous nature of the carrier allows passive diffusion of chemical liquids, the manner which in contrast to mechanical, thermal, or radiative methods, is considered to be a higher yield practice and one which enables batch processing in a manufacturing environment utilizing practices of high throughput and low cost. Preferred designs include the use of porous metal forms, including laminates, as well as surface treatment of the porous regions to facilitate exclusion principles and achieve an inert support mechanism during the stages of device manufacture. These benefits allow design flexibility and low-cost batch processing when choosing practices to handle thinned device substrates in the manufacture of semiconductors and other microelectronic devices.

Sectional porous carrier forming a temporary impervious support

In various embodiments, etchants featuring (i) mixtures of hydrochloric acid, methanesulfonic acid, and nitric acid, or (ii) mixtures of phosphoric acid, methanesulfonic acid, and nitric acid, are utilized to etch metallic bilayers while minimizing resulting etch discontinuities between the layers of the bilayer.

Etch chemistries for metallization in electronic devices

Methods and compositions are described for a temporary adhesive used to affix a work unit onto a carrier substrate whereby its porosity is tuned by choosing and adjusting the polymeric resin and filler components to provide sufficient adhesion to support a manufacturing process, and upon completion, there is advanced penetration of a liquid into the interfacial bond causing release of the work unit without harm. The temporary adhesive provides a tunable porosity that is dependent upon the mathematical calculation of the weight basis ratio of filler to binder, that is preferably greater than 1.0, more preferably greater than 2.0, and most preferably greater than 3.0. The temporary adhesive may be applied and cured in a variety of ways that meet the needs of the form of the work unit and objectives of the manufacturing process. The invention provides benefits of flexibility and reduced cost when establishing practices to handle difficult work units in the manufacture of semiconductors and flat panel displays.

Adhesive with tunable porosity and methods to support temporary bonding applications

The present invention is a charge complexing chemical composition that protects metal during polymer removal. The polymer coatings include crosslinked systems by chemical-amplification and photoacid generated (PAG) means as in epoxies. The system includes a solvent, a charge complexing additive, and an acid that creates a protective complex for sensitive metals during the dissolving and rinsing practice needed for processing microelectronic parts. The composition can be utilized with a method for removing partial and fully cured crosslinked coatings that originate from chemical amplification or PAG-epoxy photoimageable coatings.

Compositions and methods that promote charge complexing copper protection during low pKa driven polymer stripping

Compositions and methods are described for a release layer that is affixed directly onto a carrier or with the use of an interfacial adhesive layer to fabricate a flexible work product, and upon completion, the release layer is removed by an external applied force of a given value that overcomes the adhesive force without harm to the work product. The release layer serves as a permanent support for the manufacture of flexible electronic devices and upon completion offers a simple means to achieve a wide range of thin and ergonomically pleasing options for the consumer. The invention provides benefits of flexibility in choosing a host of materials to meet the needs of a specific manufacturing objective and rapidly moving towards the next step in the manufacture of semiconductors and flat panel displays.

Release layer for subsequent manufacture of flexible substrates in microelectronic applications

Compositions and methods that use rinsable primers for the removal of temporary functional coatings from substrates, for example, electronic devices, are provided. Methods are provided which discuss the use of rinsable primers to aid the removal of temporary functional coatings that include photoresist, dielectrics, adhesives, and other related materials used in temporary manufacturing applications. These compositions and methods are particularly suitable for removing temporary adhesives used in the manufacture of semiconductors and flat panel displays.

Compositions and methods of rinsable primers used to aid in the removal of temporary functional coatings

Compositions and methods are described for a temporary adhesive with adjustable adhesion force to affix a thin solid material onto a carrier whereby the force of adhesion is defined by choosing and adjusting the polymeric resin components to provide sufficient adhesion to support a manufacturing process, and upon completion, the thin solid material is removed by an external applied force of a given value that overcomes the adhesive force without harm to the thin solid material. The temporary adhesive provides a tunable adhesion force that is lower than the tensile strength of the thin solid material, preferably less than 50%, more preferably less than 25%, and most preferably less than 10% of the tensile strength of the thin solid material. The temporary adhesive may be applied and cured in a variety of ways that meet the needs of the form of the thin solid material and objectives of the manufacturing process. The invention provides benefits of flexibility and reduced cost when establishing practices to handle difficult thin solid materials in the manufacture of semiconductors and flat panel displays.

Temporary adhesive with tunable adhesion force sufficient for processing thin solid materials

The invention describes the ability to conduct multiple carrier substrate removal practices simultaneously. The fixture design is slotted in a manner to hold film frame rings and has the bottom region open without interference to the passage of the released carrier substrate. Slots in the fixture are arranged on two sides at top and bottom to support the film frame, however, the distance between the slots and the area of the open region is sufficient to allow the carrier substrate to travel downwards under gravity force, once it has been released from the device wafer. The method describes a batch process whereby a fixture design supports multiple film frames with taped adhered device wafers enable exposure to a chemical medium that either acts upon the interface between the device wafer and carrier substrate or digests the carrier substrate in a manner that results in removal.

Cassette fixture for holding film frames with affixed thin substrates during liquid chemical batch removal of carriers

Compositions and methods are described for a temporary coating and adhesive with adjustable acidity for use in coating work units as a planarization coating over high topography and also for affixing thin units onto a carrier whereby such compositions provide sufficient properties to support a manufacturing process, and upon completion, the compositions are removed by an aqueous detergent that dissolves and releases the work unit within a rapid time frame without harm to its integrity. The temporary adhesive provides a tunable acidity based upon Lewis acid represented as its acid dissociative constant, K, where it is preferred to have K&#x2267;1&#xd7;10(pK&#x2266;6), more preferred K&#x2267;1&#xd7;10(pK&#x2266;5), and most preferred K&#x2267;1&#xd7;10(pK&#x2266;4). The temporary coating and adhesive may be applied and cured in a variety of ways that meet the needs of the work unit and objectives of the manufacturing process. The invention provides benefits of flexibility and reduced cost when establishing practices to handle difficult work units in the manufacture of semiconductors and flat panel displays.

Aqueous detergent soluble coating and adhesive and methods of temporary bonding for manufacturing

The polymer mixture comprises polybenzimidazole (PBI)/polyvinylbutyral (PVB). The weight ratio (PVB:PBI) of this mixture may range from 0.25-50:50-99.75 or 15-85:15-85. The coating is based upon the polymer mixture.

Polybenzimidazole/polyvinylbutyral mixtures

Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates, are provided. A method is presented which uses a minimum amount of solid form concentrate that is diluted into water, introduced into a manufacturing tool and heated, applied to said substrate for a sufficient time to allow penetration and removal of an organic substance, and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive variety most commonly used in the manufacture of a flat panel display (FPD) and other electronic substrates.

Metal-safe solid form aqueous-based compositions and methods to remove polymeric materials in electronics manufacturing

PBI compositions include solutions comprising PBI and acrylate monomer and coatings comprising PBI and polyacrylate. The solutions may also include polymerization initiator, solvent, co-polymers. The coatings are thermally resistant, electrically insulating (dielectric), and adhesive. The PBI compositions are used in the manufacture of microelectronics and related products. Methods for applying the PBI compositions are also discussed.

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Camarillo, CA, United States of America

John Cleaon Moore