Rohm and Haas Company

Dow Global Technolgoies LLC

Ddp Specialty Electronic Materials Us, LLC

Ddp Specialty Electronic Materials US 8, LLC

John C Rohanna

Alfred Karl Schultz

George David Green

Daryl John Gisch

Collin Hunter Martin

Marvin H Tegen

Stephen Pease

Martin Slominski

Hongzhi Wang

Joshua Dear

Jennifer Reichl Collin

Alfred K Shultz

Provided is method of treating a collection of resin beads (a) comprising the steps of (a) providing the collection of resin beads (a), wherein the resin beads (a) comprise one or more vinyl polymers having quaternary ammonium groups; wherein 90 mole % or more of the quaternary ammonium groups are each associated with a chloride anion; (b) bringing the collection of resin beads (a) into contact with an aqueous solution (b) comprising one or more dissolved (M)Xto form a mixture (b), (c) separating water and compounds dissolved in the water from the mixture (b), to form resin beads (c) and waste solution (bw); (d) bringing resin beads (c) into contact with an aqueous solution (c) comprising dissolved (M3)(OH), to form a mixture (d).

Making low-sodium resin

Provided is a method for reacting a resin with sulfuric acid comprising the step of heating a reaction mixture to a temperature of 80&#xb0; C. or higher, wherein said reaction mixture comprises

Sulfonation process

Provided is a method for treating sulfuric acid comprising the step (I) of bringing said sulfuric acid into contact with a collection of solid particles (B) having BET surface area of 50 m/g to 5,000 m/g and having volume-average particle diameter of 200 &#x3bc;m or less.

Treating sulfuric acid

A method for making an anion exchange or chelant resin comprising a vinyl aromatic polymer including a repeating unit comprising an aromatic ring substituted with an aliphatic amino group, wherein the method comprises the step of reacting a vinyl aromatic polymer with a nitro compound comprising from 1 to 12 carbon atoms with the proviso that the &#x3b1; carbon includes at least one hydrogen.

Method for making anion exchange and chelant resins including aliphatic amino functional groups

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Royersford, PA, United States of America

John C Rohanna