Varian Associates, Inc.

Other

Novellus Systems Incorporated

John C Helmer

Robert L Anderson

Ronald R Cochran

Vance E Hoffman, Jr

Young H Park

Giampaolo Levi

R Ernest Demaray

Kenneth J Doniger

Ring-Ling Chien

Kwok Fai Lai

Ahmad Abu-Shumays

Dean S Burgi

Richard E Demaray

Stephen J Luchetti

A magentron sputtering apparatus includes a rotatable magnet which is either concave or convex. For one magnet structure, at least a portion of the centerline of the magnet lies along a curve defined by ##EQU1## where .xi.(r) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.

Sputtering apparatus with a rotating magnet array having a geometry for

Sputtering apparatus and method which are particularly suitable for forming step coatings. A workpiece is supported in a chamber, particles are emitted from a sputter source in a substantially uniform manner throughout an area of greater lateral extent than the workpiece, the pressure within the chamber is maintained at a level which is sufficiently low to prevent substantial scattering of the particles between the source and the workpiece, and the particles are passed through a collimating filter having a plurality of transmissive cells with a length to diameter ratio on the order of 1:1 to 3:1 positioned between the source and the workpiece to limit the angles at which the particles can impinge upon the workpiece.

Collimated deposition apparatus and method

A sputter magnetron ion source for producing an intense plasma in a cathode container which ionizes a high and substantial percentage of the sputter cathode material and means for extracting the ions of the cathode material in a beam. The ion extraction means is implemented by a magnetic field cusp configuration with a null region adjacent to the open end of the cathode container. Ions so produced are able to be directed at right angles to a substrate being coated for efficient via filling.

Physical vapor deposition employing ion extraction from a plasma

The present invention refers to a pumping stage particularly designed for turbomolecular pumps, having increased compression ratio, and capable of extending the operating range of the turbomolecular pump towards high pressure. The new pumping stage comprises a casing housing, a rotor disk, and a substantially coplanar stator ring. The stator ring consists of two plates connected with each other along their circumferential periphery, thereby defining a region of close tolerance with the opposite surfaces of the rotor. The rotor and stator cooperate to define a tapered, free annular channel having a suction port and a discharge port at the opposite ends of this channel. The channel tapers in a functional, predetermined fashion, having the largest cross-sectional area near the suction port, and converging, according to the rotational direction of the rotor, at the discharge port.

Non-centric improved pumping stage for turbomolecular pumps

The present invention relates to turbomolecular pumps comprising one or more tangential flow pumping stages in addition to axial flow pumping stages, so as to raise the pump exhaust pressure up to the atmospheric pressure, wherein at least one tangential flow pumping stage having a tangential flow pumping channel of improved design. The channel is located between the lateral surface of the rotor disk and the annular inner wall of stator and comprises an upper closure plate provided with suction port and a lower closure plate provided with diskharge port wherein these ports operably coupled to the tangential flow pumping channel. The cross-section area of the channel is enlarged from its periphery portion defined by the lateral surface of the rotor disk to a central portion defined by the upper and lower closure plates.

Tangential flow pumping channel for turbomolecular pumps

A magnetron sputter source providing a predetermined erosion distribution over the surface of a sputter target material is described. When the distribution is uniform, close coupling of the sputter target with the substrate to be coated is achieved, resulting in improved collection efficiency of the sputtered material by the wafer and improved film thickness uniformity. Elimination of erosion grooves provide for greater target consumption and longer target life. The cathode magnetron sputter source includes a rotating magnet assembly of a specific shape and a specific magnetic strength provides the desired erosion distribution. The target may be dished to improve uniformity near the periphery of the wafer. The resulting magnetron cathode is used for the deposition of thin films. Further applications of uniform magnetron erosion or preselected erosion include uniform or preselected magnetron sputter etch or reactive ion etch and concurrent deposition and etch.

Rotating sputtering apparatus for selected erosion

On-column optical detection apparatus and method for use with capillary separation columns are shown. The apparatus and method minimize the adverse effects of light scattered from the walls of the column, thereby improving detection sensitivity and providing greater dynamic range. Light from a conventional source is focussed onto a column. Spatial filter means are positioned in front of the column to prevent at least some light from striking the column wall. Another spatial filter is positioned in front of a light collecting means which gathers light emanating from the column. In a specific embodiment, a unique monolens design is shown comprising collecting and focussing lens formed as an integral unit with a bore for a capillary column.

Optical detection system for capillary separation columns

A magnetron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by ##EQU1## where .xi.(u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.

An ion source for an intense ion beam from a solid source is formed with a cathode around a central anode. A source of magnetic field with closely spaced poles is formed around a central region of the cathode so that the most intense region of the magnetic field is a torus on the inside of the cathode and the field at the anode is weak. A torus of plasma can be formed near the inside surface of the cathode which can be coated with solid source material. An ion beam can be extracted through an aperture in the cathode.

Inverted re-entrant magnetron ion source

An improved magnetron sputter source particularly suitable for magnetic materials is provided in the forming of an unfolded Penning discharge source. The two cathodes are in the form of an inner cathode roughly coplanar with an outer cathode ring. An anode radially between the cathodes is raised above the cathode surfaces so as to block line of sight from the inner cathode surface to the outer. A magnetic flux vector is imposed which passed from one cathode surface to the other. Raising the anode surface about one-fourth inch above the cathode surfaces allows raising the applied voltage so that a source of 5 kilowatts or greater is possible. Raising the anode also spreads the distribution of discharge more uniformly over the target surface and permits low pressure operation thereby facilitating good adhesion and uniform coverage of the substrate.

Planar penning magnetron sputtering device

A magnetron sputter device includes a first target having an emitting surface and a second target having a concave emitting target defined by a side wall of a frustum of cone. Separate plasma discharges for the targets are confined by separate electromagnet derived magnetic fields, coupled to the targets by pole pieces.

Magnetron sputter device having planar and curved targets

In a high-performance, high-pressure liquid chromatography system, gradient elution of solvent components from a plurality of component reservoirs can be accomplished according to a programmed temporally variable ratio by a single reciprocating pump. The pumping cycle comprises a plurality of fill strokes with intervening pumping strokes. During one of the fill strokes of the cycle, a proportioned mixture of solvent components is admitted to the pump chamber from the respective reservoirs by means of proportioning valves. During each of the other fill strokes of the cycle, only a single solvent component is admitted to the pump chamber. Consequently, a relatively low concentration of a particular component can be delivered by the pump with precision over a complete pumping cycle, although a comparatively higher and therefore more accurately measurable concentration of that component is admitted to the pump chamber during any given fill stroke. The opening and closing of the proportioning valves during the component proportioning fill stroke is sequenced to minimize deviations of the relative concentrations from the programmed concentration ratio. Proper sequencing of the proportioning valves reduces inaccuracies that would otherwise tend to occur, especially at the upper and lower concentration limits, due to effects related to the compressibility of residual solvent remaining in the pump chamber at the end of each pumping stroke.

Single-pump multiple stroke proportioning for gradient elution liquid

Method and apparatus for damping oscillatory behavior and reducing the effective time constant incident to reattainment of equilibrium pressure and flow following a change in fluid pressure or flow rate in a liquid chromatography system. The system may include a chromatographic column, a reservoir for a slightly compressible liquid mobile phase, and piston means cooperating with the reservoir and normally driven at a velocity which is constant over a given time interval, for enabling pumping of the mobile liquid phase through the chromatographic column. In accordance with the invention, a transient velocity component is superimposed upon the constant velocity component of the mobile liquid phase caused by the piston motion. The transient velocity component is proportional to the reservoir volume and to the time derivative of pressure in the reservoir. The additionally imparted motion damps the transient oscillations that arise from any pressure change imposed on the slightly compressible liquid phase. Such pressure changes may e.g., be induced during operation of the chromatography system in a gradient elution mode.

Growing community of inventors

Menlo Park, CA, United States of America

John C Helmer