Seagate Technology Incorporated

John C Bruno

Hyung Jai Lee

Paul Stephen McLeod

Dennis R Hollars

Taesun Ernest Kim

Robert B Zubeck

Yao-Tzung Roger Shih

Embodiments of the invention are directed to an etching apparatus for removing impurities from the surface of a substrate, such as a pallet and disc. Embodiments of the etching apparatus comprise a magnetic source, a cleaning chamber, a substrate transportation mechanism and a power source. The magnetic source is placed within the cleaning chamber, or vacuum chamber, which is configured to bombard the magnetic source with plasma. The substrate transportation mechanism resides within the cleaning chamber and is used to pull the pallet through the chamber between the spacing between the magnet towers. The power source, which is a DC source, is coupled to the pallet and produces an electric field which ionizes the plasma.

Apparatus for etching discs and pallets prior to sputter deposition

A hydrogenated carbon film for magnetic thin film recording media is manufactured by alternating current magnetron sputtering in an atmosphere containing argon and a hydrocarbon gas. Targets mounted side-by-side cyclically sputter and discharge charge buildup according to an alternating current. Shielding between the targets directs electrons toward the anode at a given time.

Apparatus and method for sputtering carbon

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Martinez, CA, United States of America

John C Bruno