Dow Global Technolgoies LLC

Rohm & Haas Electronic Materials LLC

John B Etienne

Matthias Stefan Ober

Duane R Romer

Sukrit Mukhopadhyay

Brad C Bailey

Pulikkottil Jacob Thomas

David D Devore

David M Pearson

Vipul Jain

Endre Szuromi

Andrew M Camelio

Todd D Senecal

Robert David Grigg

Nolan T McDougal

Jordan Reddel

Nolan T Mcdougal

Jordan C Reddel

Processes of polymerizing olefin monomers using catalyst systems comprising a procatalyst having a structure according to Formula (I).

Olefin polymerization catalysts bearing a thiazole or imidazole

The polymerization process of this disclosure includes includes polymerizing ethylene and one or more olefins in the presence of a catalyst system under olefin polymerization conditions to form an ethylene-based polymer. The catalyst system comprising a metal-ligand complex according to formula (I).

Heterocycle-heterocycle-based group IV transition metal catalysts for olefin polymerization

A polymer includes repeat units having the structure wherein R, R, Ar, Ar, and Arare defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists.

Aromatic polyacetals and articles comprising them

A photoresist composition includes a polymer with repeat units having the structure wherein each occurrence of Rand Ris independently hydrogen, unsubstituted or substituted Clinear or branched alkyl, unsubstituted or substituted Ccycloalkyl, unsubstituted or substituted Caryl, or unsubstituted or substituted Cheteroaryl; and Rand Rare optionally covalently linked to each other to form a ring that includes &#x2014;R&#x2014;C&#x2014;R&#x2014;; each occurrence of Ar, Ar, and Aris independently an unsubstituted or substituted Carylene, or unsubstituted or substituted Cheteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof.

Photoresist composition, coated substrate, and method of forming electronic device

A bis(aryl)acetal has the formula wherein Yand Yare each independently chloro, bromo, iodo, mesylate, tosylate, triflate, or B, provided that Yand Yare not both selected from chloro, bromo, and iodo; each occurrence of Bis independently a boron-containing functional group bonded to Aror Arvia a boron atom; Arand Arare each independently unsubstituted or substituted Carylene, or unsubstituted or substituted Cheteroarylene; provided that Arand Arare not covalently linked to each other to form a ring structure that includes&#x2014;Ar&#x2014;O&#x2014;C&#x2014;O&#x2014;Ar&#x2014;; andRand Rare each independently hydrogen, unsubstituted or substituted Clinear or branched alkyl, unsubstituted or substituted Ccycloalkyl, unsubstituted or substituted Caryl, or unsubstituted or substituted Cheteroaryl. The bis(aryl)acetal is useful as a monomer for oligoacetal and polyacetal synthesis via Suzuki polycondensation.

Bis(aryl)acetal compounds

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Mount Pleasant, MI, United States of America

John B Etienne