Asml Netherlands B.v.

Johannes Wilhelmus Damen

Martinus Jacobus Coenen

Jan Bex

Eugene Maria Brinkhof

Hermannus Antonius Langeler

Nicolaas Ten Kate

Raymond Wilhelmus Louis Lafarre

Yogesh Pramod Karade

Jeroen Van Duivenbode

Anko Jozef Cornelus Sijben

Henricus Hubertus Adrianus Van Hout

Anko Sijben

Eugene Brinkhof

Actuation systems and lithographic apparatus which address the issue of uncontrolled return of common mode currents are provided. In an embodiment such systems aim to prevent the occurrence of corona and discharge between high voltage electric cables in low pressure environments. An exemplary actuation system includes an actuator module, a power source and power transmission cables. The actuator module includes an electrical motor and a first plurality of shielded cables configured to connect to the electrical motor at one end. The actuator module is located in a low pressure environment and each shield of the first plurality of cables is grounded. The transmission cables electrically connect the first plurality of cables with power supply, and include an extra cable configured to connect each shield of the first plurality of cables with the first extra cable, via a choke so as to provide a return path for common-mode currents.

Actuation system and lithographic apparatus

An electrostatic clamp for use in holding an object onto a supporting table, the electrostatic clamp comprising: a multi-layer film comprising an electrode defined in an electrically conducting layer which is positioned between electrically insulating layers.

Electrostatic clamp, lithographic apparatus, and device manufacturing method

A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.

Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder

An electrical connector suitable, for example, for connecting high voltage carrying cables in a low pressure environment comprises a housing having a conducting surface and a plurality of cable insertion parts, each cable insertion part comprising an electrical conductor configured to connect to an electrical cable and an insulating sleeve surrounding the electrical conductor, wherein the housing surrounds the plurality of cable insertion parts.

Electrical connector for lithographic projection apparatus

Actuation systems and lithographic apparatus which address the issue of uncontrolled return of common mode currents are provided. In an embodiment such systems aim to prevent the occurrence of corona and discharge between high voltage electric cables in low pressure environments. An exemplary actuation system includes comprises an actuator module, a power source and power transmission cables. The actuator module includes an electrical motor and a first plurality of shielded cables configured to connect to the electrical motor at one end. The actuator module is located in a low pressure environment and each shield of the first plurality of cables is grounded. The transmission cables electrically connect the first plurality of cables with power supply, and include an extra cable configured to connect each shield of the first plurality of cables with the first extra cable, via a choke so as to provide a return path for common-mode currents.

A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The projection system includes a vacuum chamber and a controller configured to control an actuator of an optical device arranged in the vacuum chamber. The vacuum chamber includes a hermetically sealed housing in which the controller is accommodated. The housing is provided with an electrical connection configured to electrically connect the controller to the optical device, and is connected to an exterior wall of the vacuum chamber via a fluid cooling channel configured to cool the controller.

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Budel, Netherlands

Johannes Wilhelmus Damen