Von Ardenne Anlagentechnik Gmbh

Von Ardenne Gmbh

Johannes Struempfel

Reinhardt Bauer

Andreas Heisig

Hans-Christian Hecht

Heiko Richter

Falk Schwerdtfeger

Matthias Smolke

Wolfgang Erbkamm

Andrej Wolf

Hartmut Freitag

Andre Ulbricht

Matthias Klooss

Frank Hupka

Goetz Teschner

Enno Mirring

Thomas Posseckardt

Andrewas Heisig

André Ulbricht

Stanley Rehn

Steffen Goerke

Guenter Beister

Gerd Pollack

A modular-construction vacuum-coating system includes a plurality of functional chambers arranged one behind the other along a longitudinal extent in which substrates are moved through the chambers in a substrate-transporting region. To lower the production-related and installation-related outlay involved in supplying media, a functional chamber, as a first submodule, is arranged in a first module and provided with an outer interface which is the same for at least a second module.

Modular-construction vacuum-coating system

In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.

Method and arrangement for redundant anode sputtering having a dual anode arrangement

In a transport device for elongated substrates, especially in hot processes, which includes an essentially rectangular frame, formed by longitudinal and transverse spars connected to each other, in which at least three transverse spars are provided between two longitudinal spars, at least one transverse spar is made from a material, whose heat expansion coefficient differs from the heat expansion coefficient of the material of the other transverse spars or/and at least one transverse spar is connected force-free to at least one transverse support or/and at least one transverse spar is formed from an open profile.

Transport apparatus for elongate substrates

A vacuum coating unit having a pair of side by side transport devices for transporting substrates in a transport direction. Each transport device includes at least one first endless conveyor running in the transport direction and having a conveying element guided around at least two guide rollers or pulleys. The conveying element is located at a distance from a guide device extending in the transport direction parallel to the conveying element in such a way that the ends of the substrates can be introduced into the gap between the conveying element and the guide device of the transport devices and can be moved in the transport direction by the displacement of the conveying elements.

Vacuum coating system comprising a transport unit for transporting substrates

In a vacuum coating installation to coat planar substrates, comprising a vacuum chamber and a transport device arranged in the vacuum chamber for transporting the substrates along a transportation path through the vacuum chamber, with the transport device comprising a multitude of transport rollers arranged successively along the transportation path, each transport roller is adapted to be mounted at least at two different positions, vertically distanced from each other. A carrier frame has a substrate accepting structure and a guiding rod arranged at the bottom of the carrier frame in the direction of transportation to create a friction connection with the transportation device, connected to the carrier frame at the connection points, with the guiding rod being connected at least at one connection point to the carrier frame such that a relative displacement is possible of the guiding rod relative to the carrier frame in the direction of transportation.

Transporting means and vacuum coating installation for substrates of different sizes

In a transport device, which comprises at least one endless conveyor guided around at least two guide rollers, a monitoring appliance for monitoring motion of a guide roller is positioned on at least one of the guide rollers. The monitoring appliance comprises a first contact element disposed on and electrically connected with the guide roller, and a second contact element disposed near the guide roller. The first and second contact elements are arranged relative to one another in such a way that an electrical contact between them occurs with every revolution of the guide roller, such that the electric potential of the guide roller is transmitted to the second contact element. Additionally, a substrate treatment apparatus comprising such transport device is disclosed.

Transport device with a monitoring appliance and substrate treatment apparatus

A transport device for transporting elongated substrates through a vacuum coating system comprises an essentially rectangular frame and two groups of holding elements, which are rotatably mounted on opposite sides of the frame in such a manner that any pair of opposite holding elements can be connected to both ends of a substrate. Furthermore, at least one retainer bar is provided that is operatively connected to a group of holding elements in such a manner that the holding elements of this group are moveable in order to increase or decrease by choice their distance from the holding elements of the other group. Also provided are a loading and unloading device for loading and unloading the transport device, and a method for loading and unloading the transport device.

Method for loading and unloading a transport device

Transport device, loading device and method for loading and unloading the transport device

A sputtering installation has two longitudinally extended magnetrons disposed next to one another and each has a target on an upper side thereof. Increasing utilization of the targets in the sputtering installation is accomplished by homogenizing the discharge resistance of the magnetrons along the directrix such that a partial discharge resistance of a target point on the directrix has the same magnitude as the partial discharge resistance of a different target point on the directrix.

Sputtering installation with two longitudinally placed magnetrons

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Dresden, Germany

Johannes Struempfel