Asml Netherlands B.v.

Johannes Peterus Henricus De Kuster

Vadim Yevgenyevich Banine

Johannes Hubertus Josephina Moors

Lucas Henricus Johannes Stevens

Maarten Marinus Johannes Wilhelmus Van Herpen

Wouter Anthon Soer

Bastiaan Theodoor Wolschrijn

Thomas Stein

Yurii Victorovitch Sidelnikov

Kurt Gielissen

Marc Hubertus Lorenz Van Der Velden

Frank Jeroen Pieter Schuurmans

Maarten Mathijs Marinus Jansen

Juan Diego Arias Espinoza

An apparatus for manufacturing a pellicle, the apparatus comprising: a stressing assembly for stressing a film; and a substrate support for supporting a substrate, the stressing assembly and the substrate support being capable of relative movement so as to bring the substrate into contact with the film when the film is stressed.

Apparatus and method for manufacturing a pellicle, and a pellicle

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus

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Heeze, Netherlands

Johannes Peterus Henricus De Kuster