Ferroelectric Memory Gmbh

Johannes Ocker

Menno Mennenga

Stefan Müller

Marko Noack

Rolf Jähne

Haidi Zhou

Foroozan Koushan

A memory cell arrangement is provided that may include: one or more memory cells, each memory cell of the one or more memory cells including: a field-effect transistor structure; a plurality of first control nodes; a plurality of first capacitor structures, a second control node; and a second capacitor structure including a first electrode connected to the second control node and a second electrode connected to a gate region of the field-effect transistor. Each of the plurality of first capacitor structures includes a first electrode connected to a corresponding first control node of the plurality of first control nodes, a second electrode connected to the gate region of the field-effect transistor structure, and a spontaneous-polarizable region disposed between the first electrode and the second electrode of the first capacitor structure.

Memory cell with access device and memory capacitor structures

Various aspects relate to a method of manufacturing a memory cell, the method including: forming a memory cell, wherein the memory cell comprises a spontaneously-polarizable memory element, wherein the spontaneously-polarizable memory element is in an as formed condition; and carrying out a preconditioning operation of the spontaneously-polarizable memory element to bring the spontaneously-polarizable memory element from the as formed condition into an operable condition to allow for a writing of the memory cell after the preconditioning operation is carried out.

Preconditioning operation for a memory cell with a spontaneously-polarizable memory element

Memory cell arrangement and method thereof

According to various aspects, a memory cell is provided, the memory cell may include a field-effect transistor; a first control node and a second control node, a first capacitor structure including a first electrode connected to the first control node, a second electrode connected to a gate region of the field-effect transistor, and a remanent-polarizable region disposed between the first electrode and the second electrode of the first capacitor structure; and a second capacitor structure including a first electrode connected to the second control node, a second electrode connected to the gate region of the field-effect transistor. In some aspects, the first capacitor structure may have a first capacitance and the second capacitor structure may have a second capacitance different from the first capacitance.

Memory cell, memory cell arrangement, and methods thereof

A memory cell arrangement is provided that may include: a plurality of first control lines; a plurality of second control lines; a plurality of third control lines; each of a plurality of memory cell sets includes memory cells and is assigned to a corresponding one of the plurality of first control lines and includes at least a first memory cell subset addressable via the corresponding first control line, a corresponding one of the plurality of second control lines, and the plurality of third control lines, and at least a second memory cell subset addressable via the corresponding first control line, the plurality of second control lines, and a corresponding one of the plurality of third control lines. The corresponding one of the plurality of third control lines addresses the second memory cell subset of each memory cell set of the plurality of memory cell sets.

Memory cell arrangement and methods thereof

A memory cell arrangement may include: a first memory cell including a first field-effect transistor structure, a first capacitive memory structure coupled to a gate of the first field-effect transistor structure, and a first capacitive lever structure coupled to the gate of the first field-effect transistor structure, and wherein a second memory cell of the plurality of memory cells includes a second field-effect transistor structure, a second capacitive memory structure coupled to a gate of the second field-effect transistor structure, and a second capacitive lever structure coupled to the gate of the second field-effect transistor structure; wherein at least one of the first capacitive memory structure and/or the second capacitive memory structure is disposed in a memory structure region between the first capacitive lever structure and the second capacitive lever structure.

Memory cell arrangements and methods thereof

A memory cell arrangement is provided that may include: a plurality of electrode layers, wherein each of the plurality of electrode layers comprises a plurality of through holes, each of the plurality of through holes extending from a first surface to a second surface of a respective electrode layer; a plurality of electrode pillars, wherein each of the plurality of electrode pillars comprises a plurality of electrode portions, wherein each of the plurality of electrode portions is disposed within a corresponding one of the plurality of through holes; wherein the respective electrode layer and a respective electrode portion of the plurality of electrode portions form a first electrode and a second electrode of a capacitor and wherein at least one memory material portion is disposed in each of the plurality of through holes in a gap between the respective electrode layer and the respective electrode portion.

Various aspects relate to a memory cell arrangement including: a field-effect transistor based capacitive memory cell including a memory element, wherein a memory state of the memory element defines a first memory state of the field-effect transistor based capacitive memory cell and wherein a second memory state of the memory element defines a second memory state of the field-effect transistor based capacitive memory cell; and a memory controller configured to, in the case that a charging state of the field-effect transistor based capacitive memory cell screens an actual threshold voltage state of the field-effect transistor based capacitive memory cell, cause a destructive read operation to determine whether the field-effect transistor based capacitive memory cell was, prior to the destructive read operation, residing in the first memory state or in the second memory state.

Memory device, memory cell arrangement, and methods thereof

Various aspects relate to a memory cell arrangement including: a memory cell including a field-effect transistor structure and a spontaneous-polarizable memory layer; and a control circuit configured to cause a writing of the memory cell by a writing operation, the writing operation including: carrying out a writing sequence including: supplying a write signal set to the memory cell to provide a write voltage drop to bring a threshold voltage of the memory cell into a target range by polarizing the memory layer, and, subsequently, supplying a post-conditioning signal set to the memory cell to provide a post-conditioning voltage drop having opposite polarity with respect to the write voltage drop to change the threshold voltage by partially depolarizing the memory layer; and checking whether the threshold voltage is in the target range, and repeating the writing sequence in the case that the threshold voltage is not in the target range.

Various aspects relate to a memory cell arrangement including: a plurality of spontaneous-polarizable memory cells; and a control circuit configured to cause a writing of one or more first memory cells by a writing operation, wherein the writing operation includes: supplying a write signal set to the plurality of spontaneous-polarizable memory cells to provide a write voltage drop at each of the one or more first memory cells to switch a respective polarization state, the write signal set causing a disturb voltage drop at one or more second memory cells that are not intended to be written, wherein the disturb voltage drop causes a disturb of the one or more second memory cells and maintains a respective polarization state; and wherein the control circuit is further configured to supply a counter-disturb signal set to the plurality of spontaneous-polarizable memory cells, wherein the counter-disturb signal set provides a counter-disturb voltage drop at the one or more second memory cells to at least partially compensate the disturb caused by the write signal set.

A memory cell arrangement is provided that may include: one or more memory cells, each of the one or more memory cells including: an electrode pillar having a bottom surface and a top surface; a memory material portion surrounding a lateral surface portion of the electrode pillar; an electrode layer surrounding the memory material portion and the lateral surface portion of the electrode pillar, wherein the electrode pillar, the memory material portion, and the electrode layer form a capacitive memory structure; and a field-effect transistor structure comprising a gate structure, wherein the bottom surface of the electrode pillar faces the gate structure and is electrically conductively connected to the gate structure, and wherein the top surface of the electrode pillar faces away from the gate structure.

According to various aspects, a memory cell arrangement is provided, the memory cell arrangement including a control circuit configured to carry out a de-trapping writing scheme to write at least one memory cell of the memory cell arrangement into a memory state, the de-trapping writing scheme including providing one or more write voltage pulses and one or more de-trapping voltage pulses at the at least one memory cell, wherein the one or more de-trapping voltage pulses have opposite polarity with respect to the one or more write voltage pulses, and wherein one or more properties of the one or more write voltage pulses and of the one or more de-trapping voltage pulses are varied as long as the memory cell is not in the memory state.

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Dresden, Germany

Johannes Ocker