Asml Netherlands B.v.

Asml Holding N.v.

Johannes Matheus Marie De Wit

Teunis Willem Tukker

Armand Eugene Albert Koolen

Gerbrand Van Der Zouw

Henricus Petrus Maria Pellemans

Sebastianus Adrianus Goorden

Stanislav Y Smirnov

Pavel Stanislavovich Antsiferov

Nitesh Pandey

Markus Franciscus Antonius Eurlings

Vladimir Mihailovitch Krivtsun

Vladimir Mikhailovich Krivtsun

Duygu Akbulut

Henricus Martinus Johannes Van De Groes

Anko Jozef Cornelus Sijben

Martinus Maassen

Ralph Jozef Johannes Gerardus Anna Maria Smeets

Kim Gerard Feijen

Ralph Josef Johannes Gerardus Anna M Smeets

Jonas Mertes

An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.

Variable corrector of a wave front

A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.

Beam homogenizer, illumination system and metrology system

Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

Illumination system and metrology system

Disclosed are an optical system for conditioning a beam of radiation, and an illumination system and metrology apparatus comprising such an optical system. The optical system comprises one or more optical mixing elements in an optical system. The optical system defines at least a first optical mixing stage, at least a second optical mixing stage, and at least one transformation stage, configured such that radiation entering the second optical mixing stage includes a transformed version of radiation exiting the first optical mixing stage. The first and second optical mixing stages can be provided using separate optical mixing elements, or by multiple passes through the same optical mixing element. The transformation stage can be a Fourier transformation stage. Both spatial distribution and angular distribution of illumination can be homogenized as desired.

Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method

Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.

Device and method for processing a radiation beam with coherence

A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L&#x3e;d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.

Photon source, metrology apparatus, lithographic system and device manufacturing method

A scatterometer configured to derive a property of a substrate, includes an optical arrangement that produces a beam of radiation. An objective lens is arranged to focus the beam of radiation onto a target on the substrate. The optical arrangement is arranged to change the divergence of the beam incident on the objective lens, thereby changing spherical aberration caused by the objective lens on the beam focused on the target. A detection arrangement is arranged to detect the beam of radiation after reflection or scattering from the substrate.

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

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Helmond, Netherlands

Johannes Matheus Marie De Wit