Asml Netherlands B.v.

Carl-zeiss-smt Ag

Johannes Martinus Andreas Hazenberg

Bernardus Antonius Johannes Luttikhuis

Aart Adrianus Van Beuzekom

Harmen Klaas Van Der Schoot

Hernes Jacobs

Petrus Matthijs Henricus Vosters

Erik Roelof Loopstra

Patricius Aloysius Jacobus Tinnemans

Bernhard Geuppert

Franz Sorg

Laurentius Catrinus Jorritsma

Raimond Visser

Adrianus Franciscus Petrus Engelen

Johannes Wilhelmus De Klerk

Peter Deufel

Maria Johanna Agnes Rubingh

Peter Schaap

Petrus Franciscus Wilhelmus Maria Mandigers

An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.

Substrate handler, lithographic apparatus and device manufacturing method

A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

Lithographic apparatus, device manufacturing method and exchangeable optical element

Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.

Embodiments of the invention include a method of placing a substrate on a support. In an embodiment of the invention, the method includes determining a position of the substrate relative to a reference position via a sensor which outputs a sensor signal to a control unit, the determining including detecting the position of the substrate in a chamber, and determining a gripping position on the substrate; gripping the substrate at the gripping position with a gripper controlled by the control unit, and providing the substrate in a defined position on the support member, the providing including moving the substrate to a fixed position relative to the support member such that the center of the substrate arrives at a predetermined position on the support member.

Method and device for alignment of a substrate

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Veldhoven, Netherlands

Johannes Martinus Andreas Hazenberg