U.S. Philips Corporation

Asm Lithography B.v.

Johannes M Van Kimmenade

Jan Van Eijk

Cornelis D Van Dijk

Gerard Van Engelen

Adrianus Van Der Pal

Marinus Aart Van Den Brink

Fransiscus Mathijs Jacobs

Frank B Sperling

Henricus W Janssen

Adianus G Bouwer

Dominicus J Franken

Hubert A Neilen

Jan Van Eljk

Positioning device with a reference frame for a measuring system, and a

A positioning device (21, 31) with a drive unit (147, 149, 151; 69, 71) with which an object table (1, 5) is displaceable over a guide (141, 65) which is fastened to a frame (45) of the positioning device (21, 31). The positioning device (21, 31) includes a force actuator system (205) which exerts on the frame (45) a compensation force which has a moment about a reference point (P) of the frame (45) whose value is equal to a value of a moment of a force of gravity acting on the object table (1, 5) about the reference point (P), and whose direction is opposed to a direction of the moment of said force of gravity. The use of the force actuator system (205) prevents the frame (45) from vibrating or being elastically deformed when a point of application on the frame (45) of the force of gravity is displaced relative to the frame (45) during a displacement of the object table (1,5). The accuracy with which the object table (1, 5) can be positioned relative to the guide (141, 65) by the drive unit (147, 149, 151; 69, 71) is accordingly not adversely affected by such vibrations or deformations. The positioning device (21, 31) is used in a lithographic device for the manufacture of integrated semiconductor circuits. The lithographic device includes a first positioning device (21) with which a substrate holder (1) is displaceable relative to a focusing system (3), and a second positioning device (31) with which a mask holder (5) is displaceable relative to the focusing system (3). A special embodiment of a lithographic device includes a joint force actuator system (205) for the first positioning device (21) and the second positioning device (31), by which system displacements of the centers, of gravity of both the substrate holder (1) and the mask holder (5) can be compensated. The force actuator system has three force actuators (205) which are integrated with three dynamic isolators (51) with which a machine frame (45) of the lithographic device rests on a base (39).

Positioning device with a force actuator system for compensating

A positioning device with a drive unit with which an object table is displaceable over a guide which is fastened to a first frame thereof. A stationary part of the drive unit is fastened to a second frame thereof and dynamically isolated from the first frame while a reaction force of the object table arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.

Positioning device with a vibration-free object table, and lithographic

A lithographic device with a lithographic irradiation system (1, 13) which is fastened near a lower side to a mounting member (5) of a frame (7). The device is provided with a unit (65) which is formed by a positioning device (37), with which an object table (21) arranged below the irradiation system (1, 13) is displaceable, and by a support member (35), over which the object table (21) is guided by means of an aerostatic foot (31). In an operational position, the unit (65) is coupled to a carrier (67) by means of coupling members (73), the carrier (67) being suspended from the mounting member (5) by means of suspension elements (79, 81, 83), so that the unit (65) is arranged between lower frame supports (25) of the frame (7) and a compact construction is obtained. The unit (65) can be rotated from the operational position to an end position, in which the unit (65) is entirely outside the frame (7) and is easily accessible for maintenance, by means of a rotation mechanism (87) and a swivel mechanism (89). The lithographic device can be used inter alia for irradiating semiconductor substrates, a semiconductor pattern provided on a mask (11) being imaged on a semiconductor substrate (19) provided on the object table (21) by means of the irradiation system (1, 13).

Lithographic device with a suspended object table

A positioning device for manipulation of objects, provided with an object holder (5) which is rotatable about an axis of rotation (.theta.) by means of a .theta.-manipulator and is displaceable by translation along a Z-axis coinciding with the axis of rotation (.theta.) by means of a Z-manipulator. The two manipulators are coupled to each other by means of a separator (17, 153) in such a manner that the .theta.-movement and the Z-movement are independent of each other. The positioning device is particularly suitable for manipulation of objects in the submicron range, such as takes place, for example, in optical lithographic devices according to the invention.

Positioning device comprising a z-manipulator and a .theta.-manipulator

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Eil, Netherlands

Johannes M Van Kimmenade