Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Asml Holding N.v.

Amsl Netherlands B.v.

Stichting Nationaal Lucht&#x2014;en Ruimtevaartlaboratorium

Johannes Hubertus Josephina Moors

Vadim Yevgenyevich Banine

Erik Roelof Loopstra

Bastiaan Theodoor Wolschrijn

Levinus Pieter Bakker

Gerardus Hubertus Petrus Maria Swinkels

Maarten Marinus Johannes Wilhelmus Van Herpen

Dirk Heinrich Ehm

Lucas Henricus Johannes Stevens

Martinus Hendrikus Antonius Leenders

Andrei Mikhailovich Yakunin

Thomas Stein

Jan Bernard Plechelmus Van Schoot

Derk Jan Wilfred Klunder

Frank Jeroen Pieter Schuurmans

Vladimir Vitalevitch Ivanov

Hans Meiling

Johannes Henricus Wilhelmus Jacobs

Bastiaan Matthias Mertens

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Antonius Johannes Josephus Van Dijsseldonk

Jan Evert Van Der Werf

Uwe Mickan

Olav Waldemar Vladimir Frijns

Antonius Theodorus Wilhelmus Kempen

Gert-Jan Heerens

Carolus Ida Maria Antonius Spee

Hendrik Antony Johannes Neerhof

Ralph Kurt

Hans Van Der Laan

Hendricus Johannes Maria Meijer

Wouter Anthon Soer

Dzmitry Labetski

Hendrikus Gijsbertus Schimmel

Arnoud Cornelis Wassink

Johannes Christiaan Leonardus Franken

Stephan Muellender

Vladimir Vitalevich Ivanov

Edwin Te Sligte

Sjoerd Nicolaas Lambertus Donders

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Hans-Juergen Mann

Michel Riepen

Martinus Cornelis Maria Verhagen

Markus Franciscus Antonius Eurlings

Tjarko Adriaan Rudolf Van Empel

Richard Joseph Bruls

Paulus Martinus Maria Liebregts

Andrey Alexandrovich Nikipelov

Jan Steven Christiaan Westerlaken

Mark Kroon

Fei Liu

Wilhelmus Cornelis Keur

Wilhelmus Petrus De Boeij

Yuri Johannes Gabriël Van De Vijver

Norbertus Benedictus Koster

Robert Gabriël Maria Lansbergen

Alexander Matthijs Struycken

Andrew David LaForge

Yue Ma

Harm-Jan Voorma

William Peter Van Drent

Givi Georgievitch Zukavishvili

Klaus Martin Hummler

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Wolfgang Singer

Arno Jan Bleeker

Aleksey Yurievich Kolesnychenko

Marcel Mathijs Theodore Marie Dierichs

Samir A Nayfeh

Heine Melle Mulder

Dominicus Jacobus Petrus Adrianus Franken

Jozef Petrus Henricus Benschop

Paul Van Der Veen

Markus Weiss

Yang-Shan Huang

Noud Jan Gilissen

Erwin John Van Zwet

Vladimir Mihailovitch Krivtsun

Konstantin Nikolaevitch Koshelev

Konstantin Nikolaevich Koshelev

Christopher John Mason

Barrie Dudley Brewster

Erik Petrus Buurman

Albrecht Hof

Anastasius Jacobus Anicetus Bruinsma

Dennis De Graaf

Hermann Bieg

Denis Alexandrovich Glushkov

Luigi Scaccabarozzi

Jacques Cor Johan Van Der Donck

Hugo Matthieu Visser

Marius Ravensbergen

Martin Frans Pierre Smeets

Robertus Nicodemus Jacobus Van Ballegoij

Josephus Jacobus Smits

Michiel David Nijkerk

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.

Lithographic apparatus and electrostatic clamp designs

A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.

Lithographic apparatus

Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

Prolonging optical element lifetime in an EUV lithography system

Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber () containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

A component of a lithographic apparatus, the component having a contaminant trap surface provided with recesses configured to trap contaminant particles and to reduce specular reflection of DUV radiation. The recesses can have at least one dimension less than or equal to about 2 &#x3bc;m, desirably less than 1 &#x3bc;m.

A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.

Lithographic apparatus, a projection system and a device manufacturing method

A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

Radiation source

A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Lithographic apparatus, spectral purity filter and device manufacturing method

A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical element

A radiation source having a fuel stream generator () that generates and directs a fuel stream () along a trajectory towards a plasma formation location (). A pre-pulse laser radiation assembly directs a first beam of laser radiation () at the fuel stream at the plasma formation location to generate a modified fuel target (). A main pulse laser radiation assembly directs a second beam of laser radiation () at the modified fuel target at the plasma formation location to generate a radiation generating plasma (). A collector () collects the radiation and directs it along an optical axis () of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

Radiation source, lithographic apparatus, and device manufacturing method

A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.

Source-collector device, lithographic apparatus, and device manufacturing method

A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.

Module and method for producing extreme ultraviolet radiation

Growing community of inventors

Helmond, Netherlands

Johannes Hubertus Josephina Moors