Asml Netherlands B.v.

Asml Holding N.v.

Johannes Henricus Wilhelmus Jacobs

Nicolaas Ten Kate

Joost Jeroen Ottens

Martinus Cornelis Maria Verhagen

Sjoerd Nicolaas Lambertus Donders

Marco Koert Stavenga

Thibault Simon Mathieu Laurent

Erik Roelof Loopstra

Jeroen Johannes Sophia Maria Mertens

Hans Jansen

Nicolaas Rudolf Kemper

Christiaan Alexander Hoogendam

Martinus Hendrikus Antonius Leenders

Johan Gertrudis Cornelis Kunnen

Marcel Beckers

Ferdy Migchelbrink

Franciscus Johannes Joseph Janssen

Martijn Houben

Jacobus Johannus Leonardus Hendricus Verspay

Jan Steven Christiaan Westerlaken

Ruud Hendrikus Martinus Johannes Bloks

Herman Boom

Frederik Eduard De Jong

Paulus Martinus Maria Liebregts

Antonius Johannus Van Der Net

Bastiaan Andreas Wilhelmus Hubertus Knarren

Patricius Aloysius Jacobus Tinnemans

Michel Riepen

Raymond Wilhelmus Louis Lafarre

Theodorus Petrus Maria Cadee

Boris Menchtchikov

Johannes Anna Quaedackers

Jim Vincent Overkamp

Stoyan Nihtianov

Christianus Gerardus Maria De Mol

Gerben Pieterse

Robbert Jan Voogd

Richard Moerman

Bob Streefkerk

Johannes Hubertus Josephina Moors

Marcel Mathijs Theodore Marie Dierichs

Roelof Frederik De Graaf

Marcio Alexandre Cano Miranda

Ronald Van Der Ham

Koen Steffens

Tammo Uitterdijk

Wilhelmus Franciscus Johannes Simons

Sander Catharina Reinier Derks

Ivo Adam Johannes Thomas

Han Henricus Aldegonda Lempens

Gerardus Adrianus Antonius Maria Kusters

Marcus Adrianus Van De Kerkhof

Engelbertus Antonius Fransiscus Van Der Pasch

Frank Staals

Frits Van Der Meulen

Franciscus Johannes Herman Maria Teunissen

Emiel Jozef Melanie Eussen

Antonius Franciscus Johannes De Groot

Rogier Hendrikus Magdalena Cortie

Theodorus Wilhelmus Polet

Adrianus Hendrik Koevoets

Siegfried Alexander Tromp

Youri Johannes Laurentius Maria Van Dommelen

Gheorghe Tanasa

Barrie Dudley Brewster

Aschwin Lodewijk Hendricus Johannes Van Meer

Gregory Martin Mason Corcoran

Erik Willem Bogaart

Vadim Yevgenyevich Banine

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Koen Jacobus Johannes Maria Zaal

Richard Joseph Bruls

Haico Victor Kok

Wilhelmus Josephus Box

Fei Liu

Antonius Theodorus Wilhelmus Kempen

Yuri Johannes Gabriël Van De Vijver

Johannes Hubertus Antonius Van De Rijdt

Jimmy Matheus Wilhelmus Van De Winkel

Daniel Jozef Maria Direcks

Andrew David LaForge

Hernes Jacobs

Andrey Alexandrovich Nikipelov

Frank Johannes Jacobus Van Boxtel

Antonius Johannes Josephus Van Dijsseldonk

Vladimir Vitalevitch Ivanov

Leon Martin Levasier

Marinus Aart Van Den Brink

Bernardus Antonius Johannes Luttikhuis

Yang-Shan Huang

Olav Waldemar Vladimir Frijns

Bastiaan Theodoor Wolschrijn

Marcus Martinus Petrus Adrianus Vermeulen

Rene Theodorus Petrus Compen

Gert-Jan Heerens

Marcel Hendrikus Maria Beems

Edwin Cornelis Kadijk

Anthonius Martinus Cornelis Petrus De Jong

Paul Petrus Joannes Berkvens

A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

Temperature conditioning system, a lithographic apparatus and a method of temperature conditioning an object

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

Lithographic apparatus and method

Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

Prolonging optical element lifetime in an EUV lithography system

An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

Lithographic apparatus and a device manufacturing method

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber () containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Support apparatus, lithographic apparatus and device manufacturing method

A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Eindhoven, Netherlands

Johannes Henricus Wilhelmus Jacobs