Asml Netherlands B.v.

Johannes Hendrik Everhardus Aldegonda Muijderman

Vadim Yevgenyevich Banine

Markus Franciscus Antonius Eurlings

Heine Melle Mulder

Johannes Adrianus Antonius Theodorus Dams

Hako Botma

Martinus Van Duijnhoven

Benjamin Cunnegonda Henricus Smeets

Jan Jaap Krikke

Bas Johannes Petrus Roset

Cornelis Petrus Andreas Marie Luijkx

Cornelis Jacobus Van Duijn

The invention provides an inspection apparatus for inspecting an object, the apparatus comprising: a measurement system configured to measure: —a first parameter of the object across an area of interest of the object, and —a second parameter, different from the first parameter, of the object at a plurality of locations on the object; a stage apparatus configured to position the object relative to the measurement system during a measurement of the first parameter, wherein the measurement system is configured to measure the second parameter at the plurality of different locations during the measurement of the first parameter and wherein the stage apparatus is configured to position the object relative to the measurement system based on a compliance characteristic of the stage apparatus.

Inspection apparatus lithographic apparatus measurement method

A lithographic apparatus including an illumination system configured to condition a radiation beam is described. The illumination system includes radiation beam uniformity adjuster for adjusting the uniformity of the radiation beam using segments that are at least partly arranged in the radiation beam and that are mounted on a frame by a torsion bar. The device further includes an actuator configured to rotate the segment in order to change the amount of radiation of the radiation beam that is blocked. The device also includes a first magnetic member mounted on the torsion bar configured to co-operate with a second magnetic member mounted on the frame for generating a position dependent torque about the longitudinal axis that is configured to at least partly compensate a torque exerted on the segment by the torsion bar.

Lithographic apparatus and device manufacturing method

An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method

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Veldhoven, Netherlands

Johannes Hendrik Everhardus Aldegonda Muijderman