Asml Netherlands B.v.

Johannes Cornelis Paulus Melman

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Erik Henricus Egidius Catharina Eummelen

Han Henricus Aldegonda Lempens

Cornelius Maria Rops

Jorge Alberto Vieyra Salas

Ruud Olieslagers

Miao Yu

Patrick Johannes Wilhelmus Spruytenburg

John Maria Bombeeck

Artunç Ulucan

Koen Cuypers

Frank Debougnoux

Ruud Hendrikus Martinus Johannes Bloks

Yuri Johannes Gabriël Van De Vijver

Gerben Pieterse

Norbertus Josephus Martinus Van Den Nieuwelaar

Günes Nakiboglu

Coen Hubertus Matheus Baltis

Petrus Franciscus Van Gils

Thomas Augustus Mattaar

Daan Daniel Johannes Antonius Van Sommeren

Aleksandar Nikolov Zdravkov

Harold Sebastiaan Buddenberg

Victor Manuel Blanco Carballo

Ronald Frank Kox

Patricius Jacobus Neefs

Walter Theodorus Matheus Stals

Johannes Theodorus Guillielmus Maria Van De Ven

Pieter Jeroen Johan Emanuel Hoefnagels

Josephus Peter Van Lieshout

Jan-Piet Van De Ven

An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

Lithography apparatus and a method of manufacturing a device

Lithography apparatus and device manufacturing method

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Fluid handling structure and lithographic apparatus

A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.

Lithography apparatus, and a method of manufacturing a device

A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, lithographic apparatus and method of operating a lithographic apparatus

Growing community of inventors

Oisterwijk, Netherlands

Johannes Cornelis Paulus Melman