Asml Netherlands B.v.

C.c.m. Beheer B.v.

Johannes Cornelis Maria Timmermans

Johan Maria Van Boxmeer

Arnold Sinke

Marnix Aldert Tas

Nicolass Antonius Allegondus Johannes Van Asten

Jascha Van Pommeren

Johan Erhard Sluiters

A scatterometer for measuring a property of a substrate includes a focus sensing arrangement including an arrangement () that directs a first beam of radiation onto a focusing arrangement, to be detected by a focus sensor arrangement (). A focus controller () provides control signals representative of the relative positions of the focusing arrangement () and the substrate (W), which are required to focus the first beam of radiation on the substrate. An actuator arrangement adjusts the position of the focusing arrangement dependent on the control signals. An irradiation arrangement directs a second beam of radiation onto the substrate using the focusing arrangement, a measurement detector () detecting the second radiation beam after reflection from the substrate. A focus offset arrangement adjusts the focus produced by the focusing arrangement to compensate for an offset between the focusing of the first beam of radiation and the second beam of radiation.

Scatterometer and lithographic apparatus

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Eersel, Netherlands

Johannes Cornelis Maria Timmermans