Tata Steel Nederland Technology B.v.

Corus Technology B.v.

Johannes Alphonsus Franciscus Maria Schade Van Westrum

Gerardus Gleijm

Laurent Christophe Bernard Baptiste

Joannes Leonard Linden

Janis Priede

Johannes Franciscus Maria Velthuis

An apparatus for coating a substrate using physical vapor deposition, including a vacuum chamber wherein a coil is placed for keeping an amount of conductive material in levitation and for heating and evaporating that material, using a varying electric current in the coil. Isolating member are placed in the coil to isolate the coil from the levitated material. The isolating member is part of a container made of non-conductive material. The container has one or more openings for guiding evaporated conductive material to the substrate to be coated. A method for coating a substrate using physical vapor deposition is also presented.

Apparatus and method for coating a substrate

An apparatus for levitation of an amount of conductive material including a coil for keeping the material in levitation using a varying electric current in the coil. The apparatus has two coils, a first coil and a second coil, both coils generating an alternating electromagnetic field during use, the alternating electric field of the first and the second coil counteracting each other. The first and second coils are positioned such that the conductive material kept in levitation between the first coil and the second coil is evaporated. A method for generating an amount of levitated conductive material is also disclosed.

Apparatus and method for levitation of an amount of conductive material

The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapor deposition under choking conditions.

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Zevenaar, Netherlands

Johannes Alphonsus Franciscus Maria Schade Van Westrum